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Modeling metal dishing for interconnect optimization

机译:建模金属凹陷以优化互连

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摘要

An analytical dishing model is developed for the damascene process, based on experimental data and physical analysis. A study utilizing this model shows that the impact of dishing on performance can be mitigated at both the process and design stages. More specifically, process improvement is favorable when the dishing radius is less than 50 /spl mu/m. During design, dishing effects can be suppressed by uniformly splitting a wide line into several narrower lines; the most beneficial number of line-splitting is 2-4 from both efficiency and performance considerations.
机译:基于实验数据和物理分析,为镶嵌工艺开发了一个分析性的碟形模型。利用该模型进行的研究表明,碟形凹陷对性能的影响可以在过程和设计阶段得到缓解。更具体地,当凹陷半径小于50 /splμm/ m时,工艺改进是有利的。在设计过程中,可以通过将一条宽线均匀地分成几条较窄的线来抑制碟形效果。从效率和性能方面考虑,最有利的分线数量是2-4。

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