Novel fabrication process and structure of a low-voltage-operation micromirror array for optical MEMS switches

摘要

This paper describes a novel fabrication process for control electrodes which enables a micromirror array to be fabricated on LSIs. Electrodes designed to reduce drive voltage of the micromirror can be fabricated flexibly. Novel anti-sticking technology, in which a polyimide film is deposited only on control electrodes, prevents sticking between mirrors and electrodes. We fabricated a 100-ch micromirror array. The maximum rotational angle of 1/spl deg/ at 30 V was achieved using our developed technology.