首页> 外文会议>Electron Devices Meeting, 2001. IEDM Technical Digest. International >Experimental evaluation of carrier transport and device design for planar symmetric/asymmetric double-gate/ground-plane CMOSFETs
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Experimental evaluation of carrier transport and device design for planar symmetric/asymmetric double-gate/ground-plane CMOSFETs

机译:平面对称/非对称双栅/地平面CMOSFET载流子传输和器件设计的实验评估

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Demonstrated double-gate devices with excellent drive current and short-channel-effect control. The double-gate devices exhibit ideal linear, sub-threshold slope of 60 mV/dec and better than ideal saturated sub-threshold slope of 55 mV/dec. The effective mobility in all device structures follows the universal mobility curve. The symmetric double-gate offers 20% mobility enhancement over a GP device at 1.0 V gate over-drive. Because the double-gate can be operated at a much lower effective-field, substantial mobility enhancement (<2X) over scaled bulk CMOS can be achieved. For the first time, DC operation of double-gate CMOS inverters are demonstrated down to Vdd=0.3 V.
机译:演示的双栅极器件具有出色的驱动电流和短沟道效应控制。双栅极器件具有理想的线性亚阈值斜率60 mV / dec,并且比理想的饱和亚阈值斜率55 mV / dec好。所有器件结构中的有效迁移率遵循通用迁移率曲线。对称双栅极在1.0 V栅极过驱动下比GP器件提高了20%的迁移率。由于双栅极可以在低得多的有效场上工作,因此可以实现大规模CMOS迁移率的大幅提高(<2X)。首次展示了双栅极CMOS反相器的直流工作电压低至Vdd = 0.3V。

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