Cluster Tool Solution for Fabrication and Qualification of Advanced Photomasks

摘要

The reduction of wave length in optical lithography, phase shift technology and optical proximity correction (OpC), requires a rapid increase in cost effective qualification of photomasks. The knowledge about CD variation, loss of pattern fidelity especially for OPC patterna nd mask defects concerning the impact on wafer level is becoming a key issue for mask quality assessment. As part of the European Community supported ESPRIT project "Q-CAP", a new cluster concept has been developed, which allows the combination of hardware tools as well as software tools via network communication. It is designed to be open for any tool manufacturer and mask house.