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Conference on photomask and next-generation lithography mask technology

召开年：2000
召开地：Yokohama(JP)
出版时间：-

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1.Quality Assurance and Yield Improvement in Photomask Fabrication

机译：光掩模制造中的质量保证和良率提高
- 作者：Takashi Yamauchi
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
2.Pellicle degradation and its effects on surrounding environment in ArF lithography

机译：ArF光刻中膜的降解及其对周围环境的影响
- 作者：Junji Myazaki;Takashi Okagawa;Keisuke Nakazawa;Toshiro Itani;Shigeto Shigematsu;Hiroaki Nakagawa
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- ArF lithography;
- mask;
- pellicel;
- durability;
3.Assessing poly layer performance of UV defect detection systems

机译：评估紫外线缺陷检测系统的多层性能
- 作者：James A. Reynolds
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- photomask;
- defect inspection;
- detection sensitivity;
4.Characteristics of CD measurement equipment

机译：CD测量设备的特征
- 作者：Takeshi Yamane;Takashi Hirano
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Metrology;
- CD-SEM;
- Transmitted light microscope;
- Cross sectional profile;
- Lithography;
5.CrO_xF_y as a material for attenuated phase-shift masks in ArF lithography

机译：CrO_xF_y作为ArF光刻中的衰减相移掩模的材料
- 作者：Keisuke Nakazawa;Takahiro Matsuo;Toshio Onodera;Hiroaki Morimoto;Hiroshi Mohri;Chiaki Hatsuta;Naoya Hayashi
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- attenuated phase-shift mask;
- CrO_xF_y;
- ArF lithography;
- durability;
6.Foundary Maskshop Operation Strategy and Management

机译：铸造口罩车间的经营策略与管理
- 作者：C.S.Yoo;John C. H. Lin;J. J. Wang
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- foundary maskshop;
7.High-contrast i-line positive photoresist for laser reticle writer

机译：用于激光掩模版写入器的高对比度i线正性光刻胶
- 作者：Y.Kobayashi;Y.Oppata;Y.Ezoe;F.Shigemitsu;K.Urayama;K. Doi
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- positive photoresist;
- "THMR M-100";
- high-contrast;
8.Improvement of Defect Density for DUV Halftone PSM

机译：DUV半色调PSM缺陷密度的改善
- 作者：Ky Lee;Lj Kim;Km Yeon;Sw Lee;Hs Kim
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
9.Mask Cleaner Innovation

机译：面膜清洁剂创新
- 作者：Hidehiro Watanabe;Kenji Masui;Akio Kosaka;Naoya Hayamizu;Akinori Iso;Hachiro Hiratsuka;Yoshiaki Minegishi;Fumiaki Shigemitsu
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Photomask cleaning;
- MHz;
- spinner;
- UV light;
10.The End of Thresholds: Subwavelength Optical Linewidth Measurement Using the Flux-Area Technique

机译：阈值的终点：使用通量面积技术的亚波长光学线宽测量
- 作者：Peter Fiekowsky
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- CD;
- linewidth;
- mask inspection;
- metrology;
- measurement;
- photomask;
- flux-area;
11.Another Look at Stepper Lens Reduction and Field Size

机译：再看步进镜头的缩小和像场大小
- 作者：Harry J. Levinson;Paul W. Ackmann;Lori Peters;John Arnaud
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Lithography;
- masks;
- reticles;
- lens reduction;
12.Comparative study on MEEF and dose latitude between attenuated PSM and Cr binary mask

机译：PSM和Cr二元掩模的MEEF和剂量范围的比较研究
- 作者：Hyun-Joon Cho;Yong-Hoon Kim;Sung-Woon Choi;Woo-Sung Han;Jung-Min Sohn
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
13.Graphite Membrane Applied for High-Aspect-Ratio Mcirostructures Fabrication

机译：石墨膜在高纵横比微结构加工中的应用
- 作者：Hsiharng Yang;Ming-Chieh Chou;Horng-Jey Wang;Cheng Tang Pan;Jiang Long Lin
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- X-ray mask;
- x-ray micromachining;
- LIGA process;
- graphite membrane;
14.Half-Tone PSM Inspection Sensitivity of OPC Li9ne/Space pattern for 150nm Generation

机译：用于150nm生成的OPC Li9ne /空间图案的半音PSM检查灵敏度
- 作者：Chun-Yung Wu;Jackie Cheng;David Wang;Clare Wu;Yair Eran;Reuven Falah
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
15.New approach to mask and wafer performance optimization for System on a Chip (SOC) devices

机译：片上系统（SOC）器件的掩模和晶圆性能优化的新方法
- 作者：Gidi Gottlib;Yair Eran;Shirley Hemar;Ami Sade;Wolf Staud
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
16.Novel Methodology for 130-nm DRAM Cell Mask Size Optimization

机译：130 nm DRAM单元掩模尺寸优化的新方法
- 作者：H. Kanemitsu;K. Nagai;M. Asano;T. Sutani
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
17.Practical phase control technique for alternating phase shift mask fabrication

机译：用于交替相移掩模制造的实用相控技术
- 作者：Miho Takahashi;Akihiro Miyake;Hidetaka Saitou;Hiroyuki Miyashita;Shiaki mUrai
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- phase-shift mask;
- AltPSMs;
- side-etching structure;
- dry etching;
- hydrofluoric acid etching;
- phase mean deviation;
- uniformities;
18.Process scheme for removing buffer layer on multilayer of EUVL mask

机译：去除多层EUVL掩模上的缓冲层的工艺方案
- 作者：Eiichi Hoshino;Taro Ogawa;Masashi Takahashi;Hiromasa Hoko;Hiromasa Yamanashi;Naoya Hirano;Akira Chiba;Masaaki Ito;Shinji Okazaki
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- EUVL;
- Buffer layer;
- Mask Side etching;
- SiO_2;
19.Resolution Enhancement Techniques and Mask Manufacturability for Sub-Wavelength Lithography

机译：亚波长光刻的分辨率增强技术和掩模可制造性
- 作者：Lineard Karklin;Burn J.Lin
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
20.Results from a new laser pattern generator for 180 nm photomasks

机译：新型用于180 nm光掩模的激光图案发生器的结果
- 作者：Tomas Vikholm;Lars Kjellberg;Per Askebjer;Steve Haddleton;Johan Larsson;Mans Bjuggren
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
21.The knack for reticle cleaning

机译：标线清洗的诀窍
- 作者：Masumi Takahashi;Hitoshi Handa;Hisatsugu Shirai
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- reticle cleaning;
- rinse sequence;
- cleaner's QC;
- proper use;
- yield improvement;
22.The New Modified Silica Glass for 157 nm Lithography

机译：用于157 nm光刻的新型改性石英玻璃
- 作者：Y. Ikuta;S. Kikugawa;T. Kawahara;H. Mishiro;K. Okada;K. Ochiai;K. Hino;T. Nakajima;M. Kawata;S. Yoshizawa
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- silica glass;
- F_2 laser;
- 157 nm;
- vacuum-UV light;
23.Applications of MICP Surce for Next Generation Photomask Process

机译：MICP Surce在下一代光掩模工艺中的应用
- 作者：Hyuk-Joo Kwon;Byung-Soo Chang;Boo-Yeon Choi;Kyung-Ho Park;Soo-Hong Jeong
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Dry Etcher;
- Plasma uniformity;
- MICP;
- Critical dimension uniformity;
24.ArF Half-Tone PSM Cleaning Process Optimization for Next-generation Lithography

机译：用于下一代光刻的ArF半音PSM清洗工艺优化
- 作者：Yong-Seok Son;Seong-Ho Jeong;Jeong-Bae Kim;Hong-Seok Kim
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- ArF PSM Cleaning;
- Phase Transmittance;
- Particle;
- ArF-Half tone;
25.EUV Mask Absorber Characterization and Selection

机译：EUV面罩吸收剂的表征和选择
- 作者：Pei-yang Yan;Guojing Zhang;Patrick Kofron;Jeff Powers;Mark Tran;Ted Liang;Alan Stivers;Fu-Chang Lo
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- EUV mask;
- EUV mask absorber;
- EUV lithography;
- Absorber etch;
26.Evaluation of loading effect of NLD dry etching

机译：NLD干法刻蚀的加载效果评估
- 作者：Takayuki Iwamatsu;Tatsuya Fujisawa;Koji Hiruta;Hiroaki Morimoto;Noriyuki Harashima;Takaei Sasaki
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- loading effect;
- chrome dry etching;
- neutral loop discharge;
- CD uniformity;
27.Impact of MEF on 0.15- mu m KrF lithography

机译：MEF对0.15-μmKrF光刻的影响
- 作者：Haruo Iwasaki;Hiroyoshi Tanabe
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Isolated lines;
- Line and space (LS);
- Isolated hol3es;
- Dense holes;
- Mask error enhancement factor (MEF);
- 0.15- mu m KrF lithography;
28.Improvement of ZEP process for advanced mask fabrication

机译：改进用于高级掩模制造的ZEP工艺
- 作者：Yasuyuki Kushida;Yoichi Usui;Hisatsugu Shirai
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- mask;
- ZEP7000;
- resist sensitivity;
- CD uniformity;
29.Improving Reticle Quality through Reticle Blank Inspection

机译：通过光罩空白检查提高光罩质量
- 作者：William B. Howard;Kevin Krause
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- PBS;
- 895I;
- STARlight;
- blank;
- reticle;
- defects;
30.In-line Verification of Line width Uniformity for 0.18 and Below Design Rule Reticles

机译：在线验证0.18及以下设计规则掩模版的线宽均匀性
- 作者：T. Tan;S.C. Kuo
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
31.Lithography Performance of Contact Holes - Part II: Simulation of the Effects of Reticle Corner Rounding on Wafer Pritn Performance

机译：接触孔的光刻性能-第二部分：掩模版圆角修整对晶片打孔性能的模拟
- 作者：Chris A. Mack;Charles Sauer;Suzanne Weaver;Jan Chabala
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Lithography simulation;
- PROLITH/3D;
- contact holes;
32.Magnetic neutral loop discharge etching for 130 nm generation photomask fabrication

机译：磁性中性环放电刻蚀，用于制造130 nm的光掩模
- 作者：Mikio Katsumata;Hiroichi Kawahira
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- photomask;
- dry etching;
- NLD etching;
- CD uniformity;
- linearity;
- loading effect;
33.Mask Critical Dimension Error on Optical Lithography

机译：光刻技术上的掩模临界尺寸误差
- 作者：Tae-Seung Eom;Sang-Sool Koo;Seung-Weon Paek;Hee-Bom Kim;Chang-Nam Ahn;Ki-Ho Baik
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- MEF;
- DAIM;
- Aerial Image Contrast;
- Diffusion Length;
- PSM Error;
34.MASK Patterns Correction for Advanced Device

机译：高级设备的MASK模式校正
- 作者：Y.Watanabe;M. Minemura;K. Takahashi;T. Okada;K. Suzuki
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
35.Mask Roadmap, Mask Technology Trend, Critical Issues, and Activities of International SEMATECH

机译：掩模路线图，掩模技术趋势，关键问题和国际SEMATECH的活动
- 作者：Wally Carpenter
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Semiconductor roadmap;
- photomask;
- critical issues;
- infrastructure;
- technology trends;
36.New Concept i-Line Stepper for Mask Fabrication

机译：用于掩膜制造的新概念i-Line步进器
- 作者：N.Irie;K.Muramatsu;Y.Ishii;N.Magome;T.Umatate;S.Kyoh;S.Tanaka;S.Inoue;I.Higashikawa;I.Mori;K.Okumura
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- stepper;
- stitching;
- gradation filter;
- CD uniformity;
- TAT;
- SoC;
37.Advanced FIB mask repair technology for ArF Lithography

机译：用于ArF光刻的先进FIB掩模修复技术
- 作者：Koji Hiruta;Shinji Kubo;Hiroaki Morimoto;Anto Yasaka;Ryoji Hagiwara;Tatsuya Adachi;Yasutaka Morikawa;Kazuya Iwase;Naoya Hayashi
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- FIB mask repair;
- repair technology;
- ion beam;
- advanced mask;
38.Optical column of the mask-scan eb mask writer test stand

机译：Mask-Scan Eb Mask Writer测试台的光柱
- 作者：Naoharu Shimomura;Munehiro Ogasawara;Jun Takamatsu;Hitoshi Sunaoshi;Kiyoshi Hattori;Shusuke Yoshitake;Yuuji Fukudome;Kiminobu Akeno
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- electron beam;
- throughput;
- mask-scan;
- deflector;
- aberration;
39.Pellicle for F2 Laser Lithography

机译：F2激光光刻光刻胶
- 作者：T.Shirasaki;M.Kashida
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Pellicle;
- F_2 excimer laser;
- Lithography;
- Fused silica;
- Out-gas;
40.Proximity Effect Correction For Reticle Fabrication

机译：光罩制造中的邻近效应校正
- 作者：Masao Sugiyama;Shiji Kubo;Kouji Hiruta;Takayuki Iwamatsu;Tatsuya Fujiawa;Hiroaki Morimoto
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Electron beam;
- Mask writer;
- Chemically amplified resist;
- 50kV;
- Proximity effect correction;
41.Reticle defect sizing of optical proximity correction defects using SeM imaging and image analysis techniques

机译：使用SeM成像和图像分析技术确定光学邻近校正缺陷的掩模版缺陷大小
- 作者：Larry Zurbrick;Lantian Wang;Paul Konicek;Ellen Laird
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- OPC;
- defect measurement;
- defect printability;
42.Surface preparation of EUVL-mask substrate for multi-layer coating by supersonic hydrocleaning technique

机译：超声波水洗技术制备多层涂层EUVL-掩模基材的表面
- 作者：N. Hirano;H. Hoko;E. Hoshino;T. Ogawa;A. Chiba;H. Yamanashi;M. Takahashi;S. Okazaki
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- EUVL;
- EUV Lighography;
- masks;
- cleaning;
- defects;
43.The Impact of Pattern Proximity Correction on Die-to-Database Inspection

机译：图案接近度校正对模具到数据库检查的影响
- 作者：Anja Rosenbusch;Vicky Bailey;Yair Eran;Reuven Falah;Shirley Hamar;Niel Holmes;Andrew C. Hourd;Hartmut Kirsch;Andrew McArthur
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Laser proximity correction;
- CD uniformity;
- defect inspection;
- false defect calls;
- Line width bias monitor;
- Photomask;
44.Cluster Tool Solution for Fabrication and Qualification of Advanced Photomasks

机译：用于制造和鉴定高级光掩模的群集工具解决方案
- 作者：Thomas Schatz;Hans Hartmann;Kai Peter;Frederic Lalanne;Olivier Maurin;Emanuele Baracchi;Corinne Miramond;Hans-Jurgen Bruck;Gerd Scheuring;Thomas Engel;Yair Eran;Karl Sommer
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- photomask;
- automation;
- tool synergy;
- back end cluster;
- Q-CAP;
- printability;
- mask quality assessment;
45.Development of a fast line width correction system

机译：开发快速线宽校正系统
- 作者：Ryuji Takenouchi;Isao Ashida;Hiroichi Kawahira
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- optical proximity effect correction;
- geometrical operation;
- scan line method;
- parallel processing;
46.Gate CD control for Full Chip Using Total Process Proximity Based Correction Method

机译：基于全过程接近度校正方法的全芯片Gate CD控制
- 作者：Byung Ho Nam;Jong O Park;Dai Jong Lee;Jong Ho Cheong;Young Ju Hwang;Young Jin Song
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- CD control;
- OPC;
- loading effect;
- TPPC;
- PPE;
- Phase shift mask;
- Modified illumination;
47.Improvement of Cr dry etching characteristics with MERIE system

机译：利用MERIE系统改善Cr干蚀刻特性
- 作者：Hitoshi Handa;Satoshi Yamauchi;Hisatsugu Shirai
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Cr dry etching;
- MERIE;
- magnetic field;
- SAL-601;
- ZEP-7000;
48.Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13 mu m-reticle fabrication

机译：用于0.13μm掩模版制造的化学放大正性光刻胶的分辨率和精度的提高
- 作者：Tadashi Arai;Toshio Sakamizu;Kei Kasuya;Kohji Katoh;Takashi Soga;Hidetaka Saitoh;Hiroshi Shiraishi;Morihisa Hoga
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
49.Next generation lithography mask inspection

机译：下一代光刻掩模检查
- 作者：Noah Bareket;Steve Biellak;Don Pettibone;Stan Stokowski
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Mask inspection;
- NGL;
- substrate inspection;
- pattern inspection;
50.150nm DR Contact Holes Die-to-Database Inspection

机译：150nm DR接触孔芯片到数据库检查
- 作者：Shen-Chung Kuo;Taiwan Mask;Clare Wu;Yair Eran;Wolf Staud;Shirley Hemar
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
51.A 150 nm mask fabrication process using thin ZEP 7000 resist, GHOST and dry etch for the MEBES 5000 pattern generator

机译：使用薄ZEP 7000抗蚀剂，GHOST和干法刻蚀的150 nm掩模制造工艺，用于MEBES 5000图形生成器
- 作者：Myung Yong Kim;Jong Hwa Lee;Young Jin Yoon;Boo Yeon Choi
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- thin ZEP 7000 resist;
- advanced process;
- plasma etch;
- chrome etch;
52.Spray Developer for ZEP7000

机译：ZEP7000喷雾显影剂
- 作者：Atsushi Kawata;Kakuei Ozawa;Nobunori Abe
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- EB resist;
- ZEP7000;
- ZED-450;
- ZED-500;
- spray development;
- development time;
53.Analysis of Reticle Deformation, Reduction Ratio and MEEF of Future Optical Lithography

机译：未来光学光刻的掩模版变形，缩小率和MEEF分析
- 作者：Kenichi Kotoku;Koji Mikami;Ryuich Ebinuma;Yuichi Yamada;Yuan Zhang
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- reduction ratio;
- reticle size;
- mask error enhancement factor;
- cost of ownership, chip size;
- throughput;
54.Critical defects in X-ray masks for 100 nm patterns

机译：X射线掩模中100 nm图案的严重缺陷
- 作者：H. Watanabe;Y. Matsui
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Defects;
- X-ray masks;
- defect inspection;
- X-ray lithography;
- Printability;
- MEF;
55.Development of photomask processwith precise CD control, and an approach for DFM (Defect Free Manufacturing) using a cluster tool

机译：开发具有精确CD控制的光掩模工艺，以及使用群集工具进行DFM（无缺陷制造）的方法
- 作者：Shiho Sasaki;Toshifumi Yokoyama;Masa-aki Kurihara;Hiroyuki Miyashita;Naoya Hayashi;Hisatake Sano
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- photomask;
- CD control;
- CD measurement;
- defect free manufacturing;
56.Dose latitude dependency on resist contrast in e-beam mask lithography

机译：电子束掩模光刻中剂量纬度对抗蚀剂对比度的依赖性
- 作者：Byung-Cheol Cha;Seong-Yong Moon;Won-Tai;Ki;Seung-Hoon Yang;Seong-Woon Choi;Woo-Sung Han;Hee-Sun Yoon;Jung-Min Sohn
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- CD uniformity;
- dose latitude;
- overdevelopment;
- resist contrast proximity effect;
57.Investigation of Fast and Accurate Reticle Defect Assessment Methods using STARlight~(TM) for Chrome-on-Glass Reticle defects

机译：使用STARlight〜（TM）对玻璃上镀铬分划痕缺陷进行快速准确的分划痕缺陷评估方法的研究
- 作者：Ingrid B. Peterson;Kaustuve Bhattacharyya;Enio Carpi;Darius Brown;Martin Verbeek;Douglas A. Bernard
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Printability;
- simulation;
- reticle defects;
- mask inspection;
58.Newly developed mask inspection system with DUV laser illumination

机译：最新开发的具有DUV激光照明的口罩检测系统
- 作者：Katsuki Oohashi;Hiromu Inoue;Takehiko Nomura;Akira Ono;Mitsuo Tabata;Hitoshi Suzuki
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- DUV laser;
- laser illumination;
- speckle noise;
- phase plate;
59.A CA Resist with High Sensitivity and Sub 100nm Resolution for Advanced Mask Making

机译：具有高灵敏度和低于100nm分辨率的CA抗蚀剂，可用于高级掩模制造
- 作者：Wu-Song Huang;Ranee Kwong;John Hertley;Wayne Moreau;Christopher Magg;Mark Lawliss
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- resist;
- E-beam;
- chemical amplification;
- ketals;
- shaped beam;
- mask making;
60.A new photomask pattern generation method based on i-line stepper

机译：基于i-line步进器的光掩模图案生成新方法
- 作者：S.Kyoh;S.Tanaka;S.Inoue;I.Higashikawa;I.Mori;K.Okumura;N.Irie;K.Muramatsu;Y.Ishii;N.Magome;T.Umatate
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
61.Phase Defects on DUV Alternating PSMs

机译：DUV交替PSM的相位缺陷
- 作者：Ikuo Yoneda;Hideki Kanai;Shinji Yamaguchi;Iwao Higashikawa
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Alternating PSMs;
- Programmed phase shifter defect;
- Logic-Gate pattern;
62.Reticle Inspection System Using DUV Wavelength and New Algorithm Platform for Advanced Reticle Inspection for 0.13 Micron Technology Node

机译：使用DUV波长和新算法平台的光罩检测系统，用于0.13微米技术节点的高级光罩检测
- 作者：D. Alles;P. Ter Beek;S. Juang;J. Wiley;K. Hsia
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
63.Current Status of NGL Masks

机译：NGL口罩的当前状态
- 作者：David M. Walker
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- NGL;
- Mask;
- PREVAIL;
- SCALPEL;
- EPL;
- IPL;
- Stencil;
- EUV;
- Membrane;
64.Development of halftone phase-shift blank and mask fabrication for ArF lithography

机译：用于ArF光刻的半色调相移毛坯和掩模制造的开发
- 作者：Hideki Suda;Hideaki Mitsui;Osamu Nozawa;Hitoshi Ohtsuka;Megumi Takeuchi;Naoki Nishida;Yasushi Ohkubo;Masao Ushida
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- HtPSM;
- MoSi-based;
- ArF lithography;
- irradiation durability;
65.Effective OPC Pattern Generation using Chemically Amplified Resist for 0.13 mu m Design Rule Masks

机译：使用化学放大的抗蚀剂有效生成OPC图案，用于0.13微米设计规则掩模
- 作者：Il-Ho Lee;Kyung-Han Nam;Hong-Suk Kim
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
66.Integration of Optical Proximity Correction Strategies in Strong Phase Shifters design for Poly-Gate Layers

机译：在多栅极层的强移相器设计中集成了光学邻近校正策略
- 作者：Christopher Spence;Marina Plat;Emile Sahouria;Nick Cobb;Frank Schellenberg
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
67.Mask Cost of Ownership for Advanced Lithography

机译：先进光刻的掩模拥有成本
- 作者：Ed Muzio;Phil Seidel
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Mask cost;
- e-beam cost;
- cost of ownership;
- process flow;
- mask yield;
- yield forecast;
68.Next Generation Lithography Mask Fabrication at the NGL-MCOC

机译：NGL-MCOC的下一代光刻掩模制造
- 作者：Michael Lercel;Kenneth Racette;Christopher Magg;Mark Lawliss;Kevin Collins;Monica Barrett;Michael Trybendis;Lucien Bouchard
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
69.Advanced e-beam reticle writing system for next generation reticle fabrication

机译：用于下一代掩模版制造的高级电子束掩模版写入系统
- 作者：Tetsuji Nakahara;Kazui Mizuno;Suyo Asai;Yasuhiro Kadowaki;Katsuhiro Kawasaki;Hidetoshi Satoh
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
70.Structual and Thickness Distribution Evaluation of a Multi-Layer Photomask Blank with a X-Ray Reflectivity Method

机译：用X射线反射率法评估多层光掩模坯的结构和厚度分布
- 作者：Teruyoshi Hirano;Hiroshi Wada;Masao Otaki;Ryuji Matsuo
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Photomask Blank;
- Thickness;
- Thickness distribution;
- X-ray Reflectivity;
- Grazing-incidence;
71.The ALTA~circleR 3700: Extending the Application Space of the ALTA 3500 Laser Reticle writer

机译：ALTA〜circleR 3700：扩展了ALTA 3500激光刻线机的应用空间
- 作者：C. Morgante;H. C. Hamaker
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- ALTA 3700;
- ALTA 3500;
- CD uniformity;
- acousto-optic modulator;
- 8-pass printing;
- humidity effects;
- iso-dense CD bias;
72.Universal Inspection Standard for Evaluation of Inspection System and Algorithm Sensitivity and Runability

机译：评估系统，算法敏感性和可运行性评估的通用检验标准
- 作者：Jerry X. Chen;Charles Howard;Kong Son;Franklin D. Kalk;IL-Ho Lee
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Universal Inspection Standard (UIS~(TM));
- Runability;
- Sensitivity;
- Capability;
- Inspection Systems;
73.CAR blanks feasibility study results

机译：CAR Blanks可行性研究结果
- 作者：Yasunori Yokoya;Hideo Kobayashi;Masahiro Hashimoto;Fumiko Ohta;Keishi Asakawa
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
74.Current Status of 157-nm Photomask Technology Development

机译：157 nm光掩模技术发展的现状
- 作者：Giang Dao;Ronald Kuse;Kevin Orvek;Eric Panning;Roswitha Remling;Jun Fei Zheng;Munehiko Tsubosaki;Fu-Chang Lo
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- 157-nm;
- Absorber;
- Pellicle;
- Photomask;
- Fused Silica;
75.Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks

机译：隐式移位器交替相移掩模的可印刷性评估和相缺陷检查
- 作者：Edita Tejnil;Alan R. Stivers;Richard S. Schenker;Larry S. Zurbrick
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- alternating phase shift masks;
- mask inspection;
- phase defects defect printability;
- glass defect repair;
76.Fabrication Process of Alternating Phase Shift Mask for Practical Use

机译：交替使用相移掩模的制作工艺
- 作者：Naoyuki Ishiwata;Takema Kobayashi;Tomohiko Yamamoto;Hideaki Hasegawa;Satoru Asai
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
77.Fogging Effect Compensation Technique for Photomask Making

机译：光掩模制造的雾化效果补偿技术
- 作者：Yuji Nozaki;Toshiyuki Tanaka;Katsuhiro Takushima;Seki Suzuki;Akihiro Endo;Kohei Sogo;Yasuki Kimura
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Fogging effect;
- descum;
- development;
- CD uniformity;
78.Lithography Performance of Contact Holes-Part I. Optimization of Pattern Fidelity Using MPG and MPG-II

机译：接触孔的光刻性能-第一部分。使用MPG和MPG-II优化图案保真度
- 作者：Suzanne Weaver;Maiying Lu;Jan Chabala;Dinh Ton;Charles Sauer;Chris mack
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- MEBES;
- MPG;
- MPG-II;
- ProBEAM/3D;
- contact holes;
79.Pattern Shape Analysis tool for Defect Judgement of Photomask

机译：用于光掩模缺陷判断的图案形状分析工具
- 作者：Fuyuhiko Matsuo;Masao Otaki;Norithito Fukugami;Isao yonekura;Yuichi Fukushima
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- Defect inspection;
- OPC;
- Image process;
- Optical flux;
- Mask quality;
80.Elements of an Advanced Pattern Generator for 130-100 nm Maskmaking

机译：适用于130-100 nm掩模的先进图案发生器的元件
- 作者：Varoujan Chakarian;Charles Sauer;Bassam Shamoun;Frank Chilese;David Trost;marek Zywno;Ulrich Hofmann;Robin Teitzel;Richard Prior;Frederick Raymond;Abe Ghanbari;Frank Abboud
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年
- MEBES;
- electron beam;
- lithography;
- CD control;
- CD uniformity;
- graybeam;
- resist heating;
81.Requirements for Lithography and Mask Technology from the Standpoint of the System LSI Business

机译：从系统LSI业务的角度对光刻和掩模技术的要求
- 作者：K. Kawate;T. Takigawa;H. Ishiuchi;M. Goto
- 会议名称：《Conference on photomask and next-generation lithography mask technology》 | 2000年