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Internal stress around micropipes in 6H-SiC substrates

机译:6H-SiC基板中微管周围的内部应力

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Abstract: 6H-SiC single crystals are expected to be suitable substrates for thin film growth of the wide bandgap semiconductor (GaN, because it has a small lattice mismatch with GaN. Moreover, SiC single crystals are also expected for high-power and high- temperature electric applications because of its wide band gap, high breakdown voltage, high thermal conductivity and high temperature stability. Single crystals with large size used for electronic devices can be grown on seed crystals only by the modified Lely method based on sublimation deposition. But, single crystals have serious defects so called micropipes. These micropipes penetrate almost along the $LB@001$RB direction. The internal strain around micropipes was investigated using the polarizing optical microscope for the purpose of clarifying the formation mechanisms and decreasing the amount of micropipes. A special interference figure was found around a micropipe under the crossed polars on the polarizing microscope. In this work, the special interference figure around micropipes due to internal stress was explained, and the magnitude and distribution of the stress was measured by means of photoelasticity and the mapping of Raman spectra. !12
机译:摘要:6H-SiC单晶有望成为宽带隙半导体(GaN)薄膜生长的合适衬底,因为它与GaN的晶格失配很小。而且,SiC单晶也有望用于高功率和高功率。由于其宽带隙,高击穿电压,高热导率和高温稳定性,在高温电应用中的应用,只有通过基于升华沉积的改进的Lely方法,才能将用于电子器件的大尺寸单晶生长在晶种上。单晶具有严重的缺陷,称为微管,这些微管几乎沿着$ LB @ 001 $ RB方向渗透,使用偏振光学显微镜研究了微管周围的内部应变,目的是弄清其形成机理并减少微管的形成。数量的微管。在偏光显微镜上,在交叉极性下的微管周围发现了一个特殊的干涉图。在这项工作中,解释了由于内部应力引起的微管周围的特殊干涉图,并通过光弹性和拉曼光谱图测量了应力的大小和分布。 !12

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