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Breakdown mechanisms in Al(GaN) MSM photodetectors

机译:Al(GaN)MSM光电探测器的击穿机制

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AlGaN based interdigital metal-semiconductor-metal (MSM) photodetectors with 14 percent Al have been successfully grown and fabricate don sapphire substrates. The devices exhibit large gains up to 10$+6$/ at high bias voltages, but with very high dark currents, $GRT 1 mA and very long detector responses, $GRT 60 seconds. A negative temperature coefficient for the breakdown voltage was observed indicating that tunneling is occurring. However, at high bias voltages, avalanche breakdown also appears to be present since a constant breakdown field of 10$+5$/ V/cm was obtained independent of MSM geometry. Avalanche breakdown is nucleated at the non-uniform field distribution at the edge of the MSM finger.
机译:基于AlGaN基的偶代金属 - 半导体 - 金属(MSM)光电探测器,具有14%的Al已成功生长和制造唐蓝宝石基材。 该器件展示大幅增长10美元+ 6美元/在高偏置电压下,但具有非常高的暗电流,GRT 1 MA和非常长的探测器响应,$ 60秒。 观察到击穿电压的负温度系数,表明发生隧道。 然而,在高偏置电压下,雪崩击穿也似乎存在,因为获得了10 $ + 5 $ /厘米的恒定分解字段,而独立于MSM几何形状。 雪崩击穿在MSM手指边缘的非均匀场分布处成核。

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