首页> 外文会议>Indium Phosphide and Related Materials, 1998 International Conference on >Monolithically integrated InP-based minority logic gate using an RTD/HBT heterostructure
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Monolithically integrated InP-based minority logic gate using an RTD/HBT heterostructure

机译:使用RTD / HBT异质结构的单片集成基于InP的少数逻辑门

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In this paper, we report on the design, simulation, and fabrication of an InP-based high-speed monolithically integrated minority (inverted majority) logic gate, which was implemented using an MBE-grown stacked-layer epitaxial heterostructure of a resonant-tunneling-diode (RTD) and heterojunction-bipolar-transistor (HBT). The fabricated RTD's showed a peak-to-valley current ratio of 30 at room temperature and the HBT's demonstrated a current gain of 65 and a cutoff frequency (f/sub T/) of 50 GHz. The minority logic function of the fabricated monolithic RTD-HBT gate was measured using an in-house low-frequency test setup. The detailed full-scale large-signal simulations using the NDR-SPICE simulation program predict that the integrated RTD/HBT minority logic gate can operate up to 10 GHz.
机译:在本文中,我们报告了基于InP的高速单片集成少数(反向多数)逻辑门的设计,仿真和制造,该逻辑门是使用MBE生长的堆叠隧道外延异质结构进行谐振隧道实现的二极管(RTD)和异质结双极晶体管(HBT)。制成的RTD在室温下的峰谷电流比为30,而HBT的电流增益为65,截止频率(f / sub T /)为50 GHz。使用内部低频测试装置测量了所制造的整体式RTD-HBT门的少数逻辑功能。使用NDR-SPICE仿真程序进行的详细的大规模大信号仿真预测,集成的RTD / HBT少数逻辑门可以在高达10 GHz的频率下运行。

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