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Carrier lifetime in p-doped InGaAs and InGaAsP

机译:p掺杂InGaAs和InGaAsP中的载流子寿命

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摘要

Carrier lifetime has been measured in c and be doped InGaAs and InGaAsP grown by chemical beam epitaxy. At high doping level, carrier lifetime in InGaAs is limited by Auger recombination which is slightly different from that of undoped InGaAs for the same hole density. Carbon doped InGaAsP shows non radiative recombinations linked to the amphoteric nature of carbon in these materials.
机译:载流子寿命已在c中测量,并通过化学束外延生长掺杂了InGaAs和InGaAsP。在高掺杂水平下,InGaAs中的载流子寿命受到俄歇复合的限制,在相同的空穴密度下,其与未掺杂的InGaAs略有不同。碳掺杂的InGaAsP显示出与这些材料中碳的两性性质有关的非辐射复合。

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