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Suppression of reverse bias tunneling current in HgCdTe photodiodesformed by rapid thermal diffusion,

机译:通过快速热扩散抑制HgCdTe光电二极管中的反向偏置隧穿电流,

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Abstract: In this paper, we report electrical and optical properties of the rapid thermal diffused (RTD) p-n junction photodiodes fabricated on LPE-grown p-type Hg$-0.70$/Cd$-0.30$/Te/CdZnTe substrate. In comparison with the ion implanted p-n junction on the same substrate, the reverse bias tunneling current is drastically suppressed in the RTD junction. The spectral photo-response of indium diffused HgCdTe photodiode shows the high quantum efficiency and the detectivity of 1.3 by 10$+11$/ cm/Hz$+$HLF$/W. The suppression of the reverse bias leakage current, high quantum efficiency and low noise of the RTD photodiode could be explained by the suppression of the electrical active defects generation in the depletion region during the junction formation. The extracted carrier lifetime in the junction depletion region of the RTD HgCdTe photodiodes is larger than that of the ion-implanted one. !4
机译:摘要:在本文中,我们报告了在LPE生长的p型Hg $ -0.70 $ / Cd $ -0.30 $ / Te / CdZnTe衬底上制造的快速热扩散(RTD)p-n结光电二极管的电学和光学特性。与在同一基板上注入离子的p-n结相比,RTD结中的反向偏置隧穿电流得到了大幅抑制。铟扩散的HgCdTe光电二极管的光谱光响应显示出高量子效率和10 = + 11 $ / cm / Hz $ + $ HLF $ / W的检测率。 RTD光电二极管的反向偏置漏电流,高量子效率和低噪声的抑制可以通过抑制结形成过程中耗尽区中电活性缺陷的产生来解释。 RTD HgCdTe光电二极管结耗尽区中提取的载流子寿命大于离子注入的载流子寿命。 !4

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