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Suppression of reverse bias tunneling current in HgCdTe photodiodes formed by rapid thermal diffusion

机译:快速热扩散形成的HgCdTe光电二极管中反向偏压隧穿电流的抑制

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Abstract: In this paper, we report electrical and opticalproperties of the rapid thermal diffused (RTD) p-njunction photodiodes fabricated on LPE-grown p-typeHg$-0.70$/Cd$-0.30$/Te/CdZnTe substrate. In comparisonwith the ion implanted p-n junction on the samesubstrate, the reverse bias tunneling current isdrastically suppressed in the RTD junction. Thespectral photo-response of indium diffused HgCdTephotodiode shows the high quantum efficiency and thedetectivity of 1.3 by 10$+11$/ cm/Hz$+$HLF$/W. Thesuppression of the reverse bias leakage current, highquantum efficiency and low noise of the RTD photodiodecould be explained by the suppression of the electricalactive defects generation in the depletion regionduring the junction formation. The extracted carrierlifetime in the junction depletion region of the RTDHgCdTe photodiodes is larger than that of theion-implanted one. !4
机译:摘要:在本文中,我们报告了在LPE生长的p型Hg $ -0.70 $ / Cd $ -0.30 $ / Te / CdZnTe衬底上制造的快速热扩散(RTD)p型结光电二极管的电学和光学特性。与同一衬底上的离子注入p-n结相比,RTD结中的反向偏置隧穿电流得到了极大的抑制。铟扩散的HgCdTe光电二极管的光谱光响应显示出高量子效率和10,13 + 11 $ / cm / Hz $ + $ HLF $ / W的检测率。 RTD光电二极管的反向偏置漏电流,高量子效率和低噪声的抑制可以通过抑制结形成期间耗尽区中电活性缺陷的产生来解释。 RTDHgCdTe光电二极管的结耗尽区中提取的载流子寿命大于离子注入的载流子寿命。 !4

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