Electromigration and diffusionin short Al-Ni-Cr lines

机译：电迁移和扩散素短AL-NI-CR线

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摘要

To investigate why the formation of electromigration damage in Al lines alloyed with both 0.1 at.

机译：为了调查为什么在0.1 AT中合金化的Al线中的电迁移损伤的原因。

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《Symposium on materials reliability in microelectronics》|1998年||共6页
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L.C.Jacobs; A.H.Verbruggen; A.J.Kalkman; S.Radelaar; Materials Research Society;
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Electromigration and diffusionin short Al-Ni-Cr lines

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