Advances in process matching for rules-based optical proximity correction

摘要

Abstract: This paper reports advances to the Parametric Anchoring methodology in which a small number of representative line- space process measurements can be used to fit a process model to be used for Optical Proximity Correction (OPC). A correction rule table generation program uses the model to create the correction lookup tables to be used by a rules- based OPC correction program. The results of matching the process model to a variety of processes are shown.!5