机译:通过10nm节点工艺的混合光学邻近效应校正建模和收缩校正技术提高光学邻近效应校正模型的准确性
Hitachi Ltd., Central Research Laboratory, Nano-Process Research Department, 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan;
IBM Corp., 257 Fuller Road, Suite 3100, Albany, New York 12203, United States;
IBM Corp., 2070 Route 52, Hopewell Junction, New York 12533, United States;
IBM Corp., 2070 Route 52, Hopewell Junction, New York 12533, United States;
IBM Corp., 257 Fuller Road, Suite 3100, Albany, New York 12203, United States;
IBM Corp., 257 Fuller Road, Suite 3100, Albany, New York 12203, United States;
Hitachi Ltd., Central Research Laboratory, Nano-Process Research Department, 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan;
Hitachi Ltd., Central Research Laboratory, Nano-Process Research Department, 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan;
Hitachi Ltd., Central Research Laboratory, Nano-Process Research Department, 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan;
Hitachi-HighTechnologies Corporation, 882 Ichige, Hitachinaka-Shi, Ibaraki 312-8504, Japan;
Hitachi-HighTechnologies Corporation, 24-14, Nishi-Shimbashi, 1-Chome, Minato-ku, Tokyo 105-8717, Japan;
Hitachi-HighTechnologies Corporation, 882 Ichige, Hitachinaka-Shi, Ibaraki 312-8504, Japan;
Hitachi-HighTechnologies Corporation, 882 Ichige, Hitachinaka-Shi, Ibaraki 312-8504, Japan;
hybrid optical proximity-effect correction modeling; critical dimension-scanning electron microscope; contour; shrink correction;
机译:蚀刻建模,用于基于模型的65 nm节点光学邻近校正
机译:借助过程窗口感知的光学邻近校正模型的混合子分辨率辅助特征实现方法
机译:适用于14纳米及以上节点的光学邻近校正模型中的精确掩模模型实现
机译:具有OPC段库和基于模型的校正模块的高级混合光学邻近校正系统
机译:通过光学跟踪与集成几何畸变校正进行实时校正,以减少fMRI中的运动伪像
机译:校正:不同人工晶状体型号的光芒传播成像和光学质量评价
机译:校正:使用激光诱导的击穿光谱法利用具有混合稀疏部分最小二乘和最小二乘支持向量机模型的铁矿石分析的准确性改进
机译:利用背景光学深度校正的临界反射率对地静止气象卫星对香港气溶胶光学厚度反演的改进