Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography

摘要

Abstract: The fabrication of microlenses on flat and three-dimensional substrates is described. A totally dry resist process is used. The characteristics of this novel process are investigated. A technique for lens positioning and exposure was developed for a scanning electron microscope using an image processor as a beam control system. The hyperbolic profile of the microlenses is computer generated. Microlenses of cylindrical, round, and elliptical geometry were fabricated on a Si wafer and on the end of a monomode quartz fiber. Focusing of infrared light by fabricated microlenses is demonstrated. !10