Micro-Nanostructured Interfaces Fabricated by the Use of Inorganic Block Copolymer Micellar Monolayers as Negative Resist for Electron-Beam Lithography

摘要

This paper introduces an approach where the match of two different length scales, i.e., pattern from self-assembly of block copolymer micells (<100 nm) and electron-beam (e-beam) writing (>50 nm), allow the grouping of nanometer-sized gold clusters in very small numbers in even aperiodic pattern and separation of these groups at length scales that are not accessible by pure self-assembly. Thus, we could demonstrate the grouping of Au nanoclusters in different geometries such as squares, rings, or spheres.