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Electroless gold plating for high density packages

机译:高密度封装的化学镀金

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摘要

A high-density package manufacturing process is briefly described. The role, performance, and application of the electroless nickel and gold plating in the IC package manufacturing process are discussed. The superiority of electroless plating over electrolytic plating is shown. It is concluded that electroless nickel-boron and gold plating for high-density packages provide excellent solderability, corrosion resistance, and electrical performance to meet the requirements of the VLSI fabrication process. Electroless plating is found to be the best choice in multilayer ceramic package manufacturing, especially in high pin (lead) count IC package manufacturing.
机译:简要描述了高密度包装的制造过程。讨论了化学镀镍和金在IC封装制造过程中的作用,性能和应用。显示了化学镀优于电解镀的优势。结论是,用于高密度封装的化学镀镍硼和金镀层具有出色的可焊性,耐腐蚀性和电性能,可满足VLSI制造工艺的要求。化学镀是多层陶瓷封装制造中的最佳选择,特别是在高引脚(引脚)IC封装制造中。

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