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Electromigration induced interfacial microstructure evolution of solder joints in electronic packaging

机译:电子迁移引起电子包装中焊点的界面微观结构演变

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Electromigration (EM) of eutectic SnBi and SnCu solder joints with NiPdAu surface finish are studied at temperatures above their melting points. The interfacial microstructure evolutions are discussed in detail. EM induced quick cathode side metallization dissolution happens in both solder alloys. The dissolved metallization diffuses through liquid solder under EM and form thick IMCs on anode side. It is also observed that local self-heating can impact the cathode side interfacial microstructures. With oven temperature above melting points and uniform temperature distributions on the testing coupons, Ni-P and Cu metallization are fully dissolved in both SnBi and SnCu, replaced by a mixture of solder and IMCs. However, high self-heating can induce local deformation and induce NiSnP/Cu separation before EM can dissolve Cu in SnCu solder joints.
机译:在高于熔点的温度下研究了具有NiPdAu表面光洁度的共晶SnBi和SnCu焊点的电迁移(EM)。详细讨论了界面微观结构的演变。 EM诱导的阴极侧金属化快速溶解发生在两种焊料合金中。溶解的金属化物在EM下通过液态焊料扩散,并在阳极侧形成厚的IMC。还观察到局部自热会影响阴极侧界面的微观结构。当炉温高于熔点并在测试试样上具有均匀的温度分布时,Ni-P和Cu金属化完全溶解在SnBi和SnCu中,由焊料和IMC的混合物代替。然而,在EM可以将Cu溶解在SnCu焊点之前,高的自发热会引起局部变形并引起NiSnP / Cu分离。

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