Block Copolymers with a Fluoro-block for 5 nm DSA Patterning Application

摘要

In this manuscript, various fluorine-containing BCPs were synthesized by living anionic polymerization or reversible addition-fragmentation chain-transfer (RAFT) polymerization. The resulted BCPs showed high x value > 0.2. With similar x value, we observed that PS-typed BCPs formed microdomains of 5 nm within 1 min at 80 °C, whereas polymethacrylate-typed ones required 1 h annealing at 160 °C. When rigid side chain was incorporated into the polymethacrylate block, the annealing time can be shortened to 5 min at 160 °C. However, the poor film formation of the such BCP with rod-like side chain resulted in rough line pattern after the thermal annealing process. The polymethacrylate-typed BCPs generally requires high boiling point solvents for better film formation and better line patterning.