Highly substituted fullerene based spin-on organic hardmasks

摘要

Irresistible Materials has previously introduced the HM340 series of fullerene based spin-on carbon hardmasks, and reported on material characterization, including very high carbon content and high thermal stability. The materials have a low Ohnishi number providing high etch durability and the low hydrogen level allows for high-resolution etching without wiggling. In order to further increase semiconductor facilities (Fab) compatibility, thermal stability and etch resistance several new formulations are under development. Here we present the latest results for our new HM1360 series, avoiding the drain test issues encountered with higher concentration HM340 formulations, together with new and updated characterisation results for the more advanced formulations.