SILICON-BASED HARDMASK COMPOSITION(SI-SOH; SI-BASED SPIN-ON HARDMASK) AND PROCESS OF PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING THE SAME

摘要

A silicone-based hard mask composition, and the hard mask formed by using the composition are provided to improve the etching to a O2 plasma gas. A silicone-based hard mask composition comprises an organosilane-based polymer represented by (SiO1.5-Y-SiO1.5)x(R3SiO1.5)y(XSiO1.5)z(OH)e(OR6)f, and a solvent, wherein 0.05=x, y=0.9, 0=z=0.9, x+y+z=1, 0.03=e=0.2, 0.03=f=0.25; X is a functional group of the carbon number 6~30 containing a substituted or unsubstituted aromatic ring; R3 are independently an alkyl group of the carbon number 1~6; and R6 is an alkyl group of the carbon number 1~6.