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ESD Immunity Impacts of the Drain-Side Heterojunction Device Addition in HV 60 V n/pLDMOS Devices

机译:HV 60 V n / pLDMOS器件中增加漏极侧异质结器件的ESD抗扰度

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A heterojunction-Schottky diode has a low forward-voltage drop and a fast switching feature. Therefore, in this paper, the drain side heavily doped region was removed and equivalently added a heterojunction device in 60 V n/pLDMOS devices, and evaluating its ability of ESD immunity. From the TLP measure result, the optimized secondary breakdown current of nLDMOS can be increased from 2.35 A to 3.85 A (improved 63.8%); the optimized secondary breakdown current of pLDMOS can be increased from 0.78 A to 2.83 A (improved 263%). It can be found that from removing the drain-side heavily doped region in LDMOS, LDMOS devices are equivalent with a large series heterojunction device, they are indeed very effective in improving the ESD reliability of n/pLDMOS devices.
机译:异质结肖特基二极管具有低正向压降和快速开关功能。因此,在本文中,去除了漏极侧的重掺杂区,并等效地在60 V n / pLDMOS器件中添加了一个异质结器件,并评估了其抗ESD的能力。从TLP测量结果来看,nLDMOS的最佳二次击穿电流可以从2.35 A增加到3.85 A(提高了63.8%); pLDMOS的最佳二次击穿电流可以从0.78 A增加到2.83 A(提高263%)。可以发现,通过去除LDMOS中的漏极侧重掺杂区,LDMOS器件等效于大串联异质结器件,它们确实在提高n / pLDMOS器件的ESD可靠性方面非常有效。

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