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Calculation of Dielectric Constant of Buffer Layer Graphene on SiC Measured by Spectroscopy Ellipsometry using Gauss-Newton Numerical Inversion Method

机译:使用高斯牛顿数值反演法测定SiC测量的缓冲层石墨烯的介电常数

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Calculation of dielectric constant of buffer layer graphene on SiC substrate measured by Spectroscopic Ellipsometry using Gauss-Newton inversion method has been done. The data obtained from spectroscopic ellipsometry measurement are amplitude ratio (Ψ) and phase difference (Δ). The results show that Gauss-Newton numerical inversion method can be used to extract the dielectric constant of nanostructured graphene on SiC substrates (in this case buffer layer graphene). Through the Gauss-Newton numerical inversion method, we obtain the thickness of buffer layer is around 0.5 to 1 ML and has different dielectric constant value as compared to that of graphene films.
机译:已经完成了使用高斯牛皮蚀刻测量使用Gauss-Newton反演方法测量的SiC基板上缓冲层石墨烯的介电常数。从光谱椭偏测量测量获得的数据是幅度比(ψ)和相位差(δ)。结果表明,高斯 - 牛顿数值反演方法可用于在SiC基板上提取纳米结构石墨烯的介电常数(在这种情况下缓冲层石墨烯)。通过高斯 - 牛顿数值反演方法,我们获得缓冲层的厚度约为0.5至1mL,与石墨烯薄膜相比具有不同的介电常数值。

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