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首页> 外文期刊>Nanotechnology >Improvement of carrier mobility of top-gated SiC epitaxial graphene transistors using a PVA dielectric buffer layer
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Improvement of carrier mobility of top-gated SiC epitaxial graphene transistors using a PVA dielectric buffer layer

机译:使用PVA介电缓冲层改善顶部栅极SiC外延石墨烯晶体管的载流子迁移率

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The effects of treatment with polyvinyl alcohol (PVA) and a dielectric film of HfO_ 2 on the properties of SiC based epitaxial graphene have been explored and analyzed. We have characterized the carrier mobility of graphene on Si-face and C-face SiC with a layer of HfO_ 2, with or without an initial PVA treatment on the device active layer. Epitaxial graphene grown on the C-face displays a higher mobility than a film grown on the silicon face. Also, the mobility in the presence of the PVA treatment with HfO_ 2 dielectric layer has been improved, compared with the mobility after deposition of only gate dielectric: 20% in C-face graphene and 90% in Si-face graphene. This is a major improvement over the degradation normally observed with dielectric/graphene systems.
机译:探索并分析了聚乙烯醇(PVA)和HfO_2介电膜处理对SiC基外延石墨烯性能的影响。我们已经表征了石墨烯在具有HfO_2层的Si面和C面SiC上的载流子迁移率,无论是否在器件有源层上进行了初始PVA处理。在C面上生长的外延石墨烯比在硅面上生长的膜具有更高的迁移率。另外,与仅栅极电介质沉积之后的迁移率相比,在用HfO 2介电层进行PVA处理的情况下,迁移率得到了改善:C面石墨烯为20%,Si面石墨烯为90%。与介电/石墨烯系统通常观察到的降解相比,这是一个重大改进。

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