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High frequency modeling of Through Silicon Capacitors (TSC) architectures in silicon interposer

机译:硅中介层中的直通硅电容器(TSC)架构的高频建模

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The ¿¿Through Silicon Vias¿¿ technology, developed for silicon interposer interconnects network, has inspired new capacitors components named ¿¿Through Silicon Capacitors (TSC)¿¿. Two architectures of TSC are studied in this paper: the Single Sided-TSC architecture where the TSC bodies are connected in parallel by the BEOL metal layers M1 and M2 and the Double Sided-TSC architecture where the TSC bodies are connected in parallel by using the front side and the back side of the silicon interposer. Modeling methods based on a segmented approach are presented for each architecture. Measurements on a large frequency range (100 Hz¿¿¿40 GHz) are performed on prototypes of the SS-TSC architecture and the results allow to validate the corresponding modeling method. Next, a comparative study of those two architectures is performed, based on several criteria such as parasitic inductive and resistive components, resonance frequency.
机译:专为硅中介层互连网络开发的“直通硅通孔”技术启发了名为“直通硅电容器(TSC)”的新型电容器组件。本文研究了TSC的两种体系结构:单面TSC体系结构,其中TSC主体通过BEOL金属层M1和M2并联连接;以及双面TSC体系结构,其中TSC主体通过使用BOL金属层并联连接。硅中介层的正面和背面。针对每种体系结构,提出了基于分段方法的建模方法。在SS-TSC体系结构的原型上执行了在较大频率范围(100 Hz-40 GHz)上的测量,结果可以验证相应的建模方法。接下来,根据几个标准,例如寄生电感和电阻组件,谐振频率,对这两种架构进行了比较研究。

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