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Thermal effects in InAs/GaAs quantum dot vertical cavity surface emitting lasers

机译:INAS / GaAs量子点垂直腔表面发射激光器的热效应

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The performance of 1.3-μm InAs/GaAs quantum dot (QD) vertical cavity surface emitting lasers (VCSELs) is adversely affected by self-heating effect. In this talk, a self-consistent model comprising rate equations and thermal conduction equation will be presented to analyze the influence of self-heating on the carrier dynamics and output power of QD VCSELs. The simulation results indicate that the low output power is attributed to hole thermalization and escape due to the thin wetting layer. The hole confinement can be improved by increasing the number of QD layers and surface density, as well as adopting p-type modulation doping. The fabricated p-doped QD VCSELs exhibit high temperature stability in the threshold current. The highest output power of 0.435 mW and lowest threshold current of 1.2 mA under single-mode operation were achieved, with side mode suppression ratio (SMSR) of 34 dB at room temperature (RT). However, the output power is limited by the small-sized oxide apertures. To achieve both high output power and enhancement of the fundamental mode emission, a dielectric-free (DF) approach with surface-relief (SR) technique is applied in our device fabrication. Compared with the conventional dielectric-dependent (DD) method, the DF approach potentially reduces the fabrication cost and complexity. Moreover, with the same oxide aperture area, the differential resistance is reduced by 36.47% and output power is improved by 78.32% under continuous-wave (CW) operation. The output power increases up to 3.42 mW under pulsed operation with oxide aperture diameter of ∼15 μm. The surface-relief technique effectively enhances the fundamental mode emission of the QD VCSEL.
机译:1.3 - μ m inas / gaas量子点(qd)垂直腔表面发射激光器(vcsels)的性能受到自加热效果的不利影响。在该谈话中,将提出包括速率方程和热传导方程的自我一致的模型,以分析自加热对QD Vcsels的载波动力学和输出功率的影响。仿真结果表明,由于薄的润湿层,低输出功率归因于孔热化和逸出。通过增加QD层和表面密度的数量以及采用p型调制掺杂,可以提高孔限制。制造的P掺杂QD Vcsels在阈值电流中表现出高温稳定性。在室温(RT)下,实现了在单模操作下为0.435mW和1.2 mA的最高输出功率和1.2 mA的最低阈值电流。然而,输出功率受小尺寸氧化物孔的限制。为了实现高输出功率和增强基础模式发射,在我们的装置制造中应用了具有表面浮雕(SR)技术的无电介质(DF)方法。与传统的介电依赖性(DD)方法相比,DF方法可能降低了制造成本和复杂性。此外,在相同的氧化物孔径面积,差分电阻减小了36.47%,在连续波(CW)操作下,输出功率提高了78.32%。在脉冲孔径直径的脉冲操作下,输出功率增加到3.42 mw,∼ 15μ m。表面浮雕技术有效地增强了QD VCSEL的基本模式排放。

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