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Systematic study of traps in AlN/GaN/AlGaN HEMTs on SiC substrate by numerical TCAD simulation

机译:用数值TCAD模拟系统研究ALN / GAN / ALGAN HEMTS对SiC衬底的系统研究

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In this work, we investigate the impact of GaN channel traps on the performance of AlN/GaN/AlGaN HEMT device grown on SiC substrate using two-dimensional TCAD physics based simulations. Traps specifications used here are acquired from the data reported in the literature. The simulated DC characteristics are compared with experimental measurements for validation, providing an appropriate feedback for future technological improvements. Furthermore using the Low Frequency (LF) AC simulations results, we demonstrate that the LF admittance dispersion measurement is an effective tool for identifying the traps in the device structure.
机译:在这项工作中,我们研究了GaN通道陷阱对使用二维TCAD物理学模拟在SiC基板上生长的ALN / GAN / AlGaN HEMT器件的影响。这里使用的陷阱规范从文献中报告的数据获取。将模拟的直流特性与实验测量进行比较,用于验证,为未来的技术改进提供适当的反馈。此外,使用低频(LF)AC模拟结果,我们证明了LF导纳分散测量是用于识别器件结构中陷阱的有效工具。

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