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Modeling of extrinsic parasitic elements of Si based GaN HEMTs using two step de-embedding structures

机译:基于两步去嵌入结构的Si基GaN HEMT外在寄生元素建模

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A new parasitic elements extraction technique for GaN HEMT transistors on Si substrate is presented. This technique is based on the use of two de-embedding GaN structures: open and thru-short. The equivalent circuit models along with the extraction procedure are detailed. A very good agreement between measurements and simulations validate the developed extraction method.
机译:提出了一种新的用于Si衬底上的GaN HEMT晶体管的寄生元素提取技术。该技术基于使用两种去嵌入的GaN结构:开路和直通短路。详细介绍了等效电路模型以及提取过程。测量和模拟之间的很好一致性验证了开发的提取方法。

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