Modeling and analysis of cracked through silicon via (TSV) interconnections

摘要

A lumped analytical electrical model for cracked (open fault) TSVs is proposed in this paper. Accurate and reliable fault models can support the test methods for the possible defects and they can be vital to improve the quality of TSV-based 3D-ICs. The model is verified by simulations using a commercial 3D resistance, capacitance and inductance extraction tool. The presented simulation results are in close agreement with the proposed analytical expressions.