首页> 外文会议>International Vacuum Nanoelectronics Conference >Characterization and Field Emission Properties of Lanthanum Monosulfide Nanodot and Nanowire Arrays Deposited by Pulsed Laser Deposition on Self-assembled Nanoporous Al{sub}2O{sub}3 Matrix
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Characterization and Field Emission Properties of Lanthanum Monosulfide Nanodot and Nanowire Arrays Deposited by Pulsed Laser Deposition on Self-assembled Nanoporous Al{sub}2O{sub}3 Matrix

机译:通过脉冲激光沉积在自组装纳米孔Al {Sub} 2O×3矩阵上沉积沉积的镧含镧纳米粒子和纳米线阵列的表征和场发射性能。

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Successful growth of Lanthanum Monosulfide (LaS) nanodot and nanowire arrays has been performed by pulsed laser deposition (PLD) using self-assembled nanoporous alumina templates containing pores about 50nm wide and 200-300 nm deep. The arrays were characterized by X-ray Diffraction, Atomic Force Microscopy (AFM), Field Emission Scanning Electron Microscopy (FE-SEM) and Scanning Anode Field Emission Microscopy (SAFEM). The array of LaS nanodots grows selectively at boundaries between different regions of the alumina film with local hexagonal symmetry of pores. The density of these dots is about 10{sup}9/cm{sup}2 (Fig. 1). Cross sectional FE-SEM showed that LaS nanowires also grow inside the pores with a density of 10{sup}10/cm{sup}2, which is equal to the pore density of the templates. The field emission properties of the LaS nanodots grown on top of the alumina templates were measured using SAFEM. A typical current-voltage characteristic is shown in Fig.2. Using the conventional Fowler-Nordheim relation, the work function of the LaS nanodots has been extracted from the slope of the plot ln(J/F{sup}2) vs 1/F, where J is the field emission current density and F is the local applied field. This leads to an outstanding, reproducible effective work function value of ~1 eV for the LaS nanodots. The threshold for an emission current density of 1 mA/cm{sup}2 occurs around a 150 V/μm which is considerably lower than the 230 V/μm threshold value reported recently for LaS thin films. The work at the University of Cincinnati and Virginia Commonwealth University is supported by NSF under the collaborative GOALI grant: ECS-0523966.
机译:镧兰姆(LAS)纳米点和纳米线阵列的成功发展已经通过使用含50nm左右宽且深200-300纳米的孔的自组装纳米多孔氧化铝模板脉冲激光沉积(PLD)进行。通过X射线衍射,原子力显微镜(AFM),场发射扫描电子显微镜(FE-SEM)和扫描阳极场发射显微镜(SAFEM)阵列进行了表征。 LAS纳米点的阵列在具有气孔的本地六角对称氧化铝膜的不同区域之间的边界选择性地生长。这些点的密度为约10 {SUP} 9 /厘米{SUP} 2(图1)。横截面FE-SEM表明,纳米线LAS也成长内的具有10 {SUP} 10 /厘米{SUP} 2的密度,它等于模板的孔密度的孔。使用SAFEM上生长的氧化铝模板顶部的LAS纳米点的场发射性能进行测量。一个典型的电流 - 电压特性如图2所示。使用传统的Fowler-Nordheim隧关系,对LAS纳米点的功函数已经从情节LN的斜率(j / F {SUP} 2)萃取VS 1 / F,其中J是场致发射的电流密度和F是局部应用领域。这导致了一个优秀的,可重复的有效功函数〜1电子伏特的LAS纳米点值。 1毫安/厘米{SUP} 2的发射电流密度阈值周围发生150 V /微米,其显着低于230 V /μm的阈值对于LAS薄膜最近报道。 ECS-0523966:在辛辛那提和弗吉尼亚联邦大学大学的工作是由美国国家科学基金会的协作GOALI赠款支持。

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