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Physics based electro-thermal transient simulation of 4H-SiC JBS diode using Silvaco ATLAS

机译:Silvaco Atlas的4H-SiC JBS二极管的物理基于电热瞬态模拟

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The unique design of Silicon Carbide (SiC) Junction Barrier Schottky (JBS) diode has proved its superiority over silicon in the field of high energy density pulsed power applications. JBS diode design enables the development of high blocking voltage silicon carbide rectifiers with low ON-state voltage drop, low leakage and negligible reverse recovery. In pulsed power applications, devices get driven above their rated current carrying capacity for a transient duration. Under this scenario, it becomes critical to have a thorough understanding of the electro-thermal behavior of the device under pulsed condition. This research focuses on the design and simulation of a 4H-SiC JBS diode structure in Silvaco ATLAS software under steady state and pulsed conditions. Physics based models were incorporated to account for drift diffusion process, mobility, impact ionization and lattice heating. The JBS diode was designed for a blocking voltage of 3.3 kV and an ON-state current density of 100 A/cm. A schottky barrier height of 1.1 eV was selected for the device. An array of interdigitated P+ regions with optimized separation was designed to shield the schottky interface from the high blocking electric field without affecting the ON state characteristics. The simulation results were used to analyze breakdown electric field distribution, forward current conduction path, switching performance and areas of localized lattice heating. The diode structure was simulated under pulsed condition pertaining to 500 A/cm current density and the lattice temperature profile was analyzed to identify the formation of thermal hot spots in the device lattice and possible failure mechanism. The JBS diode structure was simulated for its reverse recovery at varying magnitudes of turn OFF di/dt for an ON-state current density of 100 A/cm.
机译:碳化硅(SiC)结势垒肖特基(JBS)二极管的独特的设计已经证明了它在硅优越性在高能量密度脉冲功率应用的领域。 JBS二极管的设计使高阻断电压碳化硅整流器的具有低导通状态压降,低漏和可忽略不计的反向恢复的发展。在脉冲功率应用,设备得到上面的瞬时持续时间的额定电流承载能力驱动。在这种情况下,它成为关键的是具有脉冲条件下的设备的电热行为的全面理解。这项研究侧重于Silvaco的ATLAS软件的4H-SiC JBS二极管结构的稳定状态和脉冲条件下的设计和仿真。基于物理学模型并入到帐户的漂移扩散过程,移动性,碰撞电离和晶格加热。的JBS二极管的目的是为3.3千伏的阻断电压和100 A / cm的导通电流密度。被选定为1.1eV的肖特基势垒高度的装置。交叉指型P +具有优化的分离区域的阵列被设计为屏蔽来自高阻挡电场而不影响ON状态特性的肖特基界面。仿真结果被用来分析击穿电场分布,正向工作电流传导路径,开关性能和局部晶格加热的区域。二极管结构有关500脉冲条件下模拟A /厘米的电流密度,进行分析晶格温度分布以识别在设备和晶格可能的故障机制热的热点的形成。该JBS二极管结构在用于100 A / cm的导通电流密度关闭的di / dt的幅度不一模拟为它的反向恢复。

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