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Growth of Cu-Sn intermetallic compounds during isothermal aging processing in electroplated Cu/Sn/Cu system

机译:电镀Cu / Sn / Cu体系中等温时效过程中Cu-Sn金属间化合物的生长

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Microstructure evolutions of as-reflowed and aged electroplated Cu/Sn/Cu sandwich structure with 20 or 40μm Sn layer have been investigated. Cu3Sn was observed at lower side of Cu/Sn/Cu structure with 40μm Sn layer after isothermal aging treatment for 24 hours, as for that structure with 20μm Sn layer, Cu3Sn appeared after aging for 48 hours. Regardless of Sn volume, the thickness of the blanket Cu6Sn5 and total intermetallic compounds (Cu6Sn5+Cu3Sn) increased linearly with the increasing aging time. After long-time aging processing, the layers of blanket Cu6Sn5 and Cu3Sn in the the Cu/Sn/Cu structure with 20μm Sn layer are both thicker. Volume of Sn layer has significant effect on the growth of Cu-Sn IMCs in the electroplated Cu/Sn/Cu system.
机译:研究了具有20或40μm锡层的回流和时效电镀Cu / Sn / Cu夹层结构的微观组织演变。等温时效处理24小时后,在具有40μm锡层的Cu / Sn / Cu结构的下侧观察到Cu3Sn,而对于20μm锡层的结构,时效48小时后出现Cu3Sn。无论Sn体积如何,覆盖层Cu6Sn5和总金属间化合物(Cu6Sn5 + Cu3Sn)的厚度都随着时效时间的增加而线性增加。经过长时间的时效处理后,具有20μmSn层的Cu / Sn / Cu结构中的Cu6Sn5和Cu3Sn层的厚度均较厚。 Sn层的体积对电镀Cu / Sn / Cu系统中Cu-Sn IMC的生长有重要影响。

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