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Electroplating apparatus and method considerations for high aspect-ratio through-hole copper electroplating process

机译:用于高纵横比通孔铜电镀工艺的电镀装置和方法考虑

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摘要

As the electronic products become multi-functional and complicated, relatively high-density pattern must be designed to meet these requirements. As a result, multilayer printed circuit boards (PCBs) with high aspect ratio (AR>13) through hole metallization become the main trend in fabrication. That is, how to metalize the PCBs by Copper deposit with high throwing power and reliability becomes a major research. In this topic, a batch system of electroplating equipment designed for the use in the pilot line for acid Copper plating are discussed. It is included a comparison of distance between anodes, anode and cathode, different types of solution agitation, such as air, paddle, and cathode vibration. According to the study results, the throwing power for plate-through hole and microvia plating and deposition distribution could be improved by the adjustment of anode distance (anode/anode or anode/cathode), solution agitation (both air and paddle), and rock vibration, of cathode during plating.
机译:由于电子产品变得多功能和复杂,必须设计相对高密度的图案来满足这些要求。结果,具有高纵横比(AR> 13)通孔金属化的多层印刷电路板(PCB)成为制造的主要趋势。也就是说,如何通过具有高抛力功率和可靠性的铜矿矿床使PCB金属化成为一项重大研究。在本主题中,讨论了专为用于耐酸铜电镀的试验线设计的电镀设备的批量系统。包括阳极,阳极和阴极之间的距离,不同类型的溶液搅拌等距离的比较,例如空气,桨叶和阴极振动。根据研究结果,通过调节阳极距离(阳极/阳极或阳极/阴极),溶液搅拌(空气和桨),以及岩石可以提高用于板通孔和微孔电镀和沉积分布的投掷功率。和岩石电镀过程中阴极的振动。

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