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Investigation of poly (1-vinyl imidazole co 1, 4-butanediol diglycidyl ether) as a leveler for copper electroplating of through-hole

机译:聚(1-乙烯基咪唑CO 1,4-丁二醇二缩水甘油醚)作为通孔铜电镀的水平的研究

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摘要

A leveler containing quaternary ammonium cations, namely poly (1-vinyl imidazole co 1, 4-butanediol diglycidyl ether) (VIBDGE) was synthesized and studied in this work. Quantum chemical calculations and molecular dynamics simulation of VIBDGE were employed to get insight to the adsorption model by assessing the molecular configuration and electronic orbital parameters. The simulation results reveal that VIBDGE will spontaneously absorb on the copper surface because of its tiling way, the generated nitrogen ions and the large molecular volume of VIBDGE. Galvanostatic measurements (GMs) and cyclic voltammetry (CV) tests were performed to investigate the electrochemical behaviors of VIBDGE and its synergistic mechanism with other additives. The results of GMs demonstrate VIBDGE exhibits good inhibiting performance in copper deposition. However, the reactant, namely 1-vinyl imidazole and 1, 4-butanediol diglycidyl ether, have no inhibition effect. Additionally, GMs results show that adsorption competition between bis-(sodium sulfopropyl)-disulfide (SPS) and VIBDGE is kinetically controlled and a steady state can be achieved regardless of the injection order of additives. The steady potential at lower rpm is less polarized and thus very beneficial for achieving uniform plating of through-hole (TH). The CV testes show that VIBDGE is capable of inhibiting copper deposition in the absence of chloride ions and chloride ions have a synergistic effect with VIBDGE. In addition, VIBDGE and PEG have competitive adsorption in copper deposition process. Consistent with the results of the GMs, the CV results illustrate that in the VIBDGE-SPS-PEG-Cl- system, the amount of copper deposited in the center of TH is more than that of the surface. Through the results of electroplating, it is confirmed that VIBDGE-SPS-PEG-Cl- system significantly improves the throwing power which is in accordance with simulation and electrochemical experiments. (C) 2018 Elsevier Ltd. All rights reserved.
机译:含有季铵阳离子的水平剂,即聚(1-乙烯基咪唑CO 1,4-丁二醇二缩水甘油醚)(VIBDGE),并在这项工作中研究。通过评估分子配置和电子轨道参数,采用量子化学计算和VIBDGE的分子动力学模拟来实现吸附模型。仿真结果表明,由于其百变,所产生的氮离子和vibdge的大分子量,VIBDGE将自发地吸收铜表面。进行了电气静脉测量(GMS)和循环伏安法(CV)试验,以研究VIBDGE的电化学行为及其与其他添加剂的协同机制。 GMS的结果证明VIBDGE在铜沉积中表现出良好的抑制性能。然而,反应物,即1-乙烯基咪唑和1,4-丁二醇二缩水甘油醚,具有无抑制作用。另外,GMS结果表明,双 - (磺丙基) - 硫化钠(SPS)和VIBDGE之间的吸附竞争是动力学控制的,并且无论添加剂的注射顺序如何,都可以实现稳定状态。较低RPM的稳定电位不太偏振,因此对实现通孔(TH)的均匀电镀非常有益。 CV检测表明,在没有氯离子的情况下,VIBDGE能够抑制铜沉积,氯离子具有与VIBDGE的协同作用。此外,VIBDGE和PEG在铜沉积过程中具有竞争性吸附。与GMS的结果一致,CV结果说明了在VIBDGE-SPS-PEG-CL系统中,沉积在TH的中心的铜的量大于表面的铜。通过电镀的结果,确认VIBDGE-SPS-PEG-CL-系统显着提高了根据模拟和电化学实验的抛光功率。 (c)2018年elestvier有限公司保留所有权利。

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  • 来源
    《Electrochimica Acta》 |2018年第1期|共8页
  • 作者单位

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Shennan Circuit Co Ltd Shenzhen 518053 Peoples R China;

    Shennan Circuit Co Ltd Shenzhen 518053 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 电化学工业;物理化学(理论化学)、化学物理学;
  • 关键词

    Copper electroplating; Through-hole; Leveler; Poly (1-vinyl imidazole co 1 4-Butanediol diglycidyl ether);

    机译:铜电镀;通孔;水平器;聚(1-乙烯基咪唑CO 1 4-丁二醇二缩水甘油醚);

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