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PLASMA SPUTTERED OXIDE FILMS ON HYBRID CAPTIVE DEVICE FOR REUSABLE TPS FOR RE-ENTRY SYSTEMS

机译:再入系统可重复使用TPS混合电容装置上的等离子溅射氧化膜

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A reusable Thermal protection system has to satisfy several specific requirements. One of the most critical is thecontrol of the oxidation of the materials during the re-entry step. This result may be reached through a properbalance between bulk materials with good mechanical properties and coatings with good thermal barrier properties.Carbon composites (SiC) are nowadays the most suitable candidates as they have both good thermal resistance andgood thermal stability which preserve the mechanical properties at high temperatures. However a furtherimprovement is needed: the development of a coating which allows to optimize both the oxidation protection andthe substrate adhesion.Plasma sputtered oxide films of valve-metals (Ta, Nb, Zr, Ti) deposited on hybrid captive device are proposed inthis study as a possible solution to the above-mentioned specifications.The exposed experimental findings refer to ZrO_2 nanostructured thin films deposited in a RF (13.56MHz)magnetron sputtering reactor, starting from Zr targets (purity 99,99%) in plasma fed with Ar and O_2 in differentexperimental conditions. After the deposition, some specimens were submitted to annealing performed for 5 min inair at different temperatures in the range 600-900 °C in order to increase grain growth. Chemical and morphologicalcharacterization of deposited film was carried out by means of a Field Emission Scanning Electron Microscopy(Supra40 Zeiss Microscope) equipped with an Energy Disperse Spectrometer. In addition on Carbon/Carboncomposite samples, as received and coated, dilatometric characterizations have been performed.
机译:可重复使用的热保护系统必须满足几个特定要求。最关键的之一是 重入步骤中材料氧化的控制。通过适当的方法可以达到此结果 具有良好机械性能的散装材料与具有良好热障性能的涂层之间的平衡。 如今,碳复合材料(SiC)具有良好的耐热性和耐热性,因此是最合适的候选材料。 良好的热稳定性,可在高温下保持机械性能。但是进一步 需要改进:开发一种涂层,该涂层可以同时优化抗氧化性能和抗氧化性能。 基材的附着力。 提出了在混合俘获装置上沉积的阀金属(Ta,Nb,Zr,Ti)的等离子溅射氧化膜。 这项研究是对上述规范的可能解决方案。 暴露的实验发现是指在射频(13.56MHz)中沉积的ZrO_2纳米结构薄膜 磁控溅射反应器,从以Ar和O_2注入的等离子体中的Zr目标(纯度为99.99%)开始 实验条件。沉积后,将一些样品进行5分钟的退火处理。 空气在600-900°C范围内的不同温度下进行,以增加谷物的生长。化学和形态 沉积膜的表征通过场发射扫描电子显微镜进行 (Supra40 Zeiss Microscope)配备了能量分散光谱仪。除了碳/碳 对复合样品,如收到和涂覆的那样,已进行了膨胀特性分析。

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