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PLASMA SPUTTERED OXIDE FILMS ON HYBRID CAPTIVE DEVICE FOR REUSABLE TPS FOR RE-ENTRY SYSTEMS

机译:用于再入系统的可重复使用TPS的混合夹持装置上的等离子体溅射氧化物膜

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A reusable Thermal protection system has to satisfy several specific requirements. One of the most critical is the control of the oxidation of the materials during the re-entry step. This result may be reached through a proper balance between bulk materials with good mechanical properties and coatings with good thermal barrier properties. Carbon composites (SiC) are nowadays the most suitable candidates as they have both good thermal resistance and good thermal stability which preserve the mechanical properties at high temperatures. However a further improvement is needed: the development of a coating which allows to optimize both the oxidation protection and the substrate adhesion. Plasma sputtered oxide films of valve-metals (Ta, Nb, Zr, Ti) deposited on hybrid captive device are proposed in this study as a possible solution to the above-mentioned specifications. The exposed experimental findings refer to ZrO_2 nanostructured thin films deposited in a RF (13.56MHz) magnetron sputtering reactor, starting from Zr targets (purity 99,99%) in plasma fed with Ar and O_2 in different experimental conditions. After the deposition, some specimens were submitted to annealing performed for 5 min in air at different temperatures in the range 600-900 °C in order to increase grain growth. Chemical and morphological characterization of deposited film was carried out by means of a Field Emission Scanning Electron Microscopy (Supra40 Zeiss Microscope) equipped with an Energy Disperse Spectrometer. In addition on Carbon/Carbon composite samples, as received and coated, dilatometric characterizations have been performed.
机译:可重复使用的热保护系统必须满足几种特定要求。其中一个最关键的是在重新进入步骤期间控制材料的氧化。可以通过具有良好的机械性能和具有良好热阻挡性能的良好机械性能和涂层的散装材料之间的适当平衡来达到该结果。如今,碳复合材料(SiC)是最合适的候选物,因为它们具有良好的耐热性和良好的热稳定性,其在高温下保持机械性能。然而,需要进一步的改进:涂层的开发,其允许优化氧化保护和基板粘附。在该研究中提出了沉积在杂交圈成型装置上的阀金属(Ta,Nb,Zr,Ti)的等离子体溅射氧化物作为可能的解决方案。暴露的实验结果是指沉积在RF(13.56MHz)磁控溅射反应器中的ZrO_2纳米结构薄膜,从在不同的实验条件下从zr靶(纯度999%)开始于血浆中的血浆和O_2。在沉积之后,将一些样品提交至在600-900℃范围内的不同温度下在空气中进行的退火,以增加晶粒生长。沉积膜的化学和形态学表征借助于配备有能量分散光谱仪的场发射扫描电子显微镜(SUPRA40 Zeiss显微镜)进行。除碳/碳复合样品上,如所接收和涂覆,已经进行了膨胀表征。

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