首页> 外文会议>ISPDI 2011;International symposium on photoelectronic detection and imaging >Dislocation cell structures in CdZnTe substrates and its behavior of threading into HgCdTe LPE epilayers
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Dislocation cell structures in CdZnTe substrates and its behavior of threading into HgCdTe LPE epilayers

机译:CdZnTe衬底中的位错细胞结构及其穿入HgCdTe LPE外延层的行为

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Dislocation cell structures in CdZnTe substrates and its behavior of threading into HgCdTe LPE epilayers were studied. A kind of dislocation cell structure of which dislocations linearly pile up to three <1 1 0> orientations on the (1 1 1)B face of CdZnTe crystal was found. The formation of this cell structure can be demonstrated by the enrichment of the dislocations through slip during the growth or cooling process. By comparing the dislocation densities and distributions of HgCdTe LPE epilayers with it of CdZnTe substrates at the constant region using an optical microscopy system, the behavior of cell structures of CdZnTe substrates threading into HgCdTe LPE epilayers were also discussed. The results show that the stored dislocation densities at the dislocation walls can significantly affect the behavior of dislocation cell structures threading into HgCdTe LPE epilayers. Dislocation cell structures of which dislocation walls have higher stored dislocation densities can appear in constant region of HgCdTe epilayers. But the dislocations of HgCdTe epilayers growth on CdZnTe substrate with lower stored dislocation densities at the dislocation walls are almost uniformly distributed.
机译:研究了CdZnTe衬底中的位错细胞结构及其穿入HgCdTe LPE外延层的行为。发现了一种位错单元结构,其位错在CdZnTe晶体的(1 1 1)B面上线性堆积多达三个<1 1 0>方向。这种细胞结构的形成可以通过在生长或冷却过程中通过滑移使位错富集来证明。通过使用光学显微镜系统比较HgCdTe LPE外延层和CdZnTe衬底在恒定区域的位错密度和分布,还讨论了穿入HgCdTe LPE外延层的CdZnTe衬底的细胞结构行为。结果表明,位错壁上存储的位错密度可以显着影响穿入HgCdTe LPE外延层的位错细胞结构的行为。 HgCdTe外延层的恒定区域中会出现位错壁具有较高存储位错密度的位错细胞结构。但是HgCdTe外延层在CdZnTe衬底上生长的位错在位错壁上具有较低的存储位错密度,几乎是均匀分布的。

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