首页> 外文会议>2011 IEEE 20th Conference on Electrical Performance of Electronic Packaging and Systems >Impact of Through-Silicon-Via capacitance on high frequency supply noise in 3D-stacks
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Impact of Through-Silicon-Via capacitance on high frequency supply noise in 3D-stacks

机译:硅通孔电容对3D堆栈中高频电源噪声的影响

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We analyze the bias and frequency dependent capacitance of the Power/Ground (P/G) Through-Silicon-Via (TSVs) and its impact on the high-frequency noise in the power delivery network (PDN) of a 3D stack. We show that the P/G TSVs in a 3D PDN act as on-chip distributed decoupling capacitances and hence, help reduce the high-frequency impedance. We present that for the same cross-sectional area, P/G TSVs created using a cluster of small diameter TSVs has higher capacitance than a single large diameter TSV and hence, can further reduce the high-frequency PDN impedance.
机译:我们分析了功率/接地(P / G)硅通孔(TSV)的偏置和频率相关电容,以及其对3D堆栈供电网络(PDN)中高频噪声的影响。我们表明,3D PDN中的P / G TSV充当片上分布式去耦电容,因此有助于降低高频阻抗。我们提出,对于相同的横截面积,使用小直径TSV簇形成的P / G TSV具有比单个大直径TSV更高的电容,因此可以进一步降低高频PDN阻抗。

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