Microstructure and properties of TiAIN compound films fabricated on AZ91D alloy by magnetron sputtering

摘要

By means of reaction magnetron sputtering, TiAIN ternary compound films were deposited on AZ91D magnesium alloy substrates. The influence of partial pressure ratio of N_2 to Ar (N_2/Ar) on the microstructure and properties of TiAIN film was explored with scanning electron microscopy (SEM), X-ray diffraction (XRD), and tests of microhardness, hydrophile and corrosion resistance. The results show that with the increase of N_2/Ar partial pressure ratio from 0.5:10 to 1.5:10, Ti2N becomes the main film phase and the size of the crystals cluster decreases. As the N_2/Ar ratio is as higher as 2:10, the film crystals change from Ti2N to TiN with coarse clusters. With increase of N_2/Ar rate, the hardness, hydrophobic nature and corrosion resistance of the TiAIN film tend to increase.