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Rapid Thermal Annealing Effect On Valence-band Splitting Behavior in GaN{sub}xAs{sub}(1-x)/GaAs

机译:GaN {Sub} {Sub}(1-x)/ GaAs中的基于价带分裂行为的快速热退火效应

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Our investigation is about rapid thermal annealing(RTA) effect on valence-band splitting(VBS) of GaN{sub}xAs{sub}(1-x). The observed VBS between light- and heavy-hole induced by lattice strain in GaN{sub}xAs{sub}(1-x) epilayers is gradually weakened by the RTA process. This could be attributed to strain relax caused by nitrogen reorganization after RTA.
机译:我们的研究是关于GaN {Sub} {Sub}(1-x)的价带分裂(VBS)的快速热退火(RTA)效应。通过GaN {Sub} {Sub} {Sub}(1-x)XAs(1-x)ePilayers在GaN {sub} {sub} {sub}(1-x)epilayers诱导的光和重孔之间观察到的vbs是通过RTA过程逐渐削弱。这可能归因于RTA后氮重组引起的菌株松弛。

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