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A 210mV 7.3MHz 8T SRAM with Dual Data-Aware Write-Assists and Negative Read Wordline for High Cell-Stability, Speed and Area-Efficiency

机译:具有双数据感知写助助手和负读字线的210mV 7.3MHz 8T SRAM,用于高电池稳定性,速度和区域效率

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This work proposes an 8T cell with dual data-aware write-assist (D~2AW) and negative read-WL (NRWL) schemes to increase the figure of merit (FOM): [cell stability (CS)*cycle frequency (f)]/[cell area (A)*minimum VDD (VDDmin)]. The column-based D~2AW provides, for the first time, the solution to the trade-off between the row/column half-select (HS)-CS margins and the write margin (WM) thanks to the dual data-aware controls of: 1) cell-VSS (DA-CVSS) and 2) write-wordline (DA-WWL). NRWL expands the RBL voltage swing (V_(RBLS)), while accelerating BL developing time (T_(BLS)). A fabricated 65nm 128-row 16Kb D~2AW8T SRAM achieved 7.3MHz/48MHz at VDD=210mV/300mV. The resulting "CS*f/(A*VDDmin)" is 14+x higher than that of other low-VDDmin SRAM cells.
机译:这项工作提出了一个带有双数据感知写辅助(D〜2aw)和负读-WL(NRWL)方案的8T单元,以增加优点(FOM):[小区稳定性(CS)*循环频率(F) ] / [细胞区域(a)*最小VDD(VDDMIN)]。由于双数据感知控件,首次提供基于列的D〜2aw为行/列半选择(HS)边距和写边距(WM)之间的权衡提供的解决方案以下:1)Cell-VSS(DA-CVSS)和2)写字线线(DA-WWL)。 NRWL扩展RBL电压摆幅(V_(RBL)),同时加速BL开发时间(T_(BLS))。在VDD = 210mV / 300mV下实现了75nm 128行16KB D〜2aW8T SRAM。由此产生的“CS * f /(​​a * vddmin)”高于其他低VDDMIN SRAM单元的14 + x。

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