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Design Features and Performance Evaluation of the First 6.5kV/1200A Trench Gate IGBT Module

机译:第一6.5kV / 1200A沟槽栅极IGBT模块的设计特点和性能评估

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This paper reports for the first time, the design features and performace of the first 6.5kV/1200A IGBT module. Large IGBT and FRD chip sizes and new shrunk VLD termination has been used to increase the nominal operating current and achieve low IGBT Vce(sat) of 3.3V/3.8V at 25deg C/125deg C respectively. In addition, it is shown that a newly developed Gen3 TTO(Terrace Trench Oxide) IGBT technology minimises increase in capacitance and gate charge as chip area increases. The TTO technology features assymetric oxide active trenches in addition to several dummy trenches with thick oxide linning. It is shown that the dummy trenches can either be floating or connected to emitter potential in different configurations to achieve desired Eon and turn-on dI/dt. The new 6.5kV/1200A performance show that it is possible to further increase the power density of 6.5kV modules in the 190mmx140mm outline and achieve higher IGBT RBSOA with only moderate increase in dynamic losses
机译:本文首次报告了前6.5kV / 1200A IGBT模块的设计功能和执行。 大型IGBT和FRD芯片尺寸和新的缩小VLD终止已被用于增加标称工作电流,并分别在25deg C / 125deg C的3.3V / 3.8V实现低IGBT VCE(SAT)。 另外,显示新开发的Gen3 TTO(露台氧化物)IGBT技术最小化电容和栅电荷的增加,因为芯片面积增加。 除了具有厚氧化物衬里的多个虚设沟槽之外,TTO技术还具有相对氧化物活性沟槽。 结果表明,虚设沟槽可以浮动或连接到不同配置中的发射极电位,以实现所需的EON和导通DI / DT。 新的6.5kV / 1200A性能表明,可以进一步提高190mmx140mm轮廓中的6.5kV模块的功率密度,并实现高度增加动态损失的IGBT RBSOA

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