首页> 外国专利> NARROW ACTIVE CELL IE TYPE TRENCH GATE IGBT AND A METHOD FOR MANUFACTURING A NARROW ACTIVE CELL IE TYPE TRENCH GATE IGBT

NARROW ACTIVE CELL IE TYPE TRENCH GATE IGBT AND A METHOD FOR MANUFACTURING A NARROW ACTIVE CELL IE TYPE TRENCH GATE IGBT

机译:窄有源单元IE型沟槽栅极IGBT及其制造方法

摘要

In an equal width active cell IE type IGBT, a wide active cell IE type IGBT, and the like, an active cell region is equal in trench width to an inactive cell region, or the trench width of the inactive cell region is narrower. Accordingly, it is relatively easy to ensure the breakdown voltage. However, with such a structure, an attempt to enhance the IE effect entails problems such as further complication of the structure. The present invention provides a narrow active cell IE type IGBT having an active cell two-dimensional thinned-out structure, and not having a substrate trench for contact.
机译:在等宽有源单元IE型IGBT,宽有源单元IE型IGBT等中,有源单元区域的沟槽宽度等于无源单元区域,或者无源单元区域的沟槽宽度更窄。因此,比较容易确保击穿电压。然而,对于这种结构,试图增强IE效果会带来诸如该结构进一步复杂化的问题。本发明提供了一种具有有源单元二维减薄结构并且不具有用于接触的衬底沟槽的窄有源单元IE型IGBT。

著录项

  • 公开/公告号US2018069108A1

    专利类型

  • 公开/公告日2018-03-08

    原文格式PDF

  • 申请/专利权人 RENESAS ELECTRONICS CORPORATION;

    申请/专利号US201715807975

  • 发明设计人 HITOSHI MATSUURA;

    申请日2017-11-09

  • 分类号H01L29/739;H01L29/40;H01L29/06;H01L29/08;H01L29/66;H01L29/10;

  • 国家 US

  • 入库时间 2022-08-21 12:58:57

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