Controlling the Optimize Deposition of Thin Film in D.C Plasma Magnetron Sputtering and Measuring the Surface Conductivity by Hall Effect

摘要

Summary form only given. In our investigation, thin films of copper and brass were prepared by D.C. magnetron sputtering and coated on flat glasses. We have investigated the effects of their thicknesses on electrical and optical properties of the films. Also we have discussed on how we can control the rate of deposition in the set of D.C. plasma sputtering magnetron by controlling the beam and nanostructures. Then, we have measured the conductivity of the surfaces by Hall effect. So the results have shown that the resistivity of the thin films is a function of applied voltage. Moreover, we have shown that the decrease in resistivity by increasing the thickness is due to the increment in the carrier concentrations with increase in the thicknesses of films