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Photoluminescence study of strain-compensated GaInNAs/GaAs/GaAs quantum-well structures grown by molecular-beam epitaxy

机译:分子束外延生长的应变补偿GaInNAs / GaAs / GaAs量子阱结构的光致发光研究

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We report on photoluminescence properties of as-grown and rapid thermally annealed 1.3-/spl mu/m GaInNAs/GaNAs/GaAs quantum-well structures, grown by solid-source molecular-beam epitaxy. Insertion of strain-compensating GaNAs layers in between the GaInNAs well and the GaAs barriers of a GaInNAs/GaAs quantum well shifts the emission towards longer wavelengths, at the expense of line broadening. Luminescence performances of the GaNAs strain-compensated quantum wells were found to be controlled by nitrogen concentration and GaNAs layers width. The presence of the GaNAs barriers sustained a bigger annealing-induced blue shift of the QW photoluminescence spectrum than that met in samples without GaNAs barrier layers.
机译:我们报告了由固体源分子束外延生长的快速生长且快速退火的1.3- / spl mu / m GaInNAs / GaNAs / GaAs量子阱结构的光致发光特性。在GaInNAs阱和GaInNAs / GaAs量子阱的GaAs势垒之间插入应变补偿GaNAs层,使发射向更长的波长偏移,但以增加线宽为代价。发现GaNAs应变补偿量子阱的发光性能受氮浓度和GaNAs层宽度的控制。与没有GaNAs阻挡层的样品相比,GaNAs阻挡层的存在使QW光致发光光谱的退火诱导的蓝移更大。

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