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Whole-chip ESD protection strategy for CMOS integrated circuits in nanotechnology

机译:纳米技术中CMOS集成电路的全芯片ESD保护策略

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On-chip electrostatic discharge (ESD) protection circuits are built in IC chips to protect the devices and circuits against ESD damage. But, ESD protection circuits constructed with scaled-down CMOS devices are very susceptible to ESD stress. Therefore, novel ESD protection solutions must be developed to overcome this reliability challenge for integrated circuits fabricated in nano-scale CMOS technology. The whole-chip ESD protection strategy for CMOS integrated circuits in nanotechnology has been proposed with two main methods. One is the substrate- triggered circuit technique used to effectively improve ESD robustness of devices in the nano-scale CMOS technology. The other is the novel design concept of "ESD buses" used to solve the internal ESD damage issue of CMOS IC with multiple and separated power lines. The internal circuits or interface circuits, realized by nano-scale CMOS devices, are more sensitive to such internal ESD damage issue. By using ESD buses, ESD current can be quickly discharged far away from the internal circuits or interface circuits of CMOS IC to achieve the goal of whole-chip ESD protection.
机译:IC芯片内置了片上静电放电(ESD)保护电路,以保护器件和电路不受ESD损害。但是,使用按比例缩小的CMOS器件构成的ESD保护电路非常容易受到ESD应力的影响。因此,必须开发新颖的ESD保护解决方案,以克服以纳米级CMOS技术制造的集成电路的可靠性挑战。提出了两种主要的纳米技术CMOS集成电路的全芯片ESD保护策略。一种是衬底触发电路技术,用于在纳米级CMOS技术中有效提高器件的ESD鲁棒性。另一个是“ ESD总线”的新颖设计概念,用于解决具有多条和分开的电源线的CMOS IC的内部ESD损坏问题。由纳米级CMOS器件实现的内部电路或接口电路对这种内部ESD损坏问题更为敏感。通过使用ESD总线,可以将ESD电流快速释放到远离CMOS IC的内部电路或接口电路的地方,从而达到全芯片ESD保护的目的。

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