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The accumulation channel driven bipolar transistor (ACBT): a new MOS-gated semiconductor power device

机译:累积通道驱动双极晶体管(ACBT):一种新型MOS门控半导体功率器件

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A new power device called the Accumulation Channel driven Bipolar Transistor (ACBT) which has no parasitic thyristor is described in this paper. Unlike previous MOS-gate devices without a P-base region, the potential barrier to the flow of electrons from N/sup +/ emitter into N-drift region in the ACBT is created using the built-in potential of a P-N junction formed along the sidewall and bottom of a shallow trench. The potential barrier height is sufficiently large even at high collector voltages to prevent the direct injection of electrons from N/sup +/ emitter into the N-drift region. An accumulation layer formed along the deep trench sidewall (when the n-channel MOSFET in the ACBT is turned-on) is the only path for electrons to enter into the N-drift region. This results in high voltage current saturation with wide FBSOA for the ACBT. The ACBT has been successfully fabricated using a unique, self-aligned double trench process.
机译:本文介绍了一种新的功率器件,称为累积沟道驱动双极晶体管(ACBT),它没有寄生晶闸管。与以前的没有P基极区的MOS栅极器件不同,使用沿形成的PN结的内置电势来创建对电子从AC / N中的N / sup + /发射极流向N-漂移区的势垒。浅沟槽的侧壁和底部。即使在高集电极电压下,势垒高度也足够大,以防止电子从N / sup + /发射极直接注入N漂移区。沿深沟槽侧壁形成的累积层(当ACBT中的n沟道MOSFET导通时)是电子进入N漂移区的唯一途径。这会导致ACBT具有宽FBSOA的高压电流饱和。 ACBT已使用独特的自对准双沟槽工艺成功制造。

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