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New evaluation method for reliability of poly-Si thin film transistors using pico-second time-resolved emission microscope

机译:皮秒时间分辨发射显微镜评估多晶硅薄膜晶体管可靠性的新方法

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We have analyzed degradation of n-channel TFTs under dynamic stress using a pico-second time-resolved emission microscope. We have successfully detected emission in the pulse fall edge for the first time. We have also obtained a hot electron current during the pulse fall using a device simulation that took the transient effect into consideration. Based on the reasonable agreement between the experimental emission intensity and the theoretical current, we proposed a new degradation model.
机译:我们已经使用皮秒时间分辨发射显微镜分析了在动态应力下n沟道TFT的退化。我们首次成功检测到脉冲下降沿中的发射。我们还使用器件仿真(考虑了瞬态效应)获得了脉冲下降期间的热电子电流。基于实验发射强度与理论电流之间的合理一致性,我们提出了一种新的退化模型。

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