10/spl times/10 and 5/spl times/5, a high mirror fill factor (<70%), low voltage operation (>30 V), single crystal silicon (SCS) micromirror arrays have been designed, fabricated, and tested. Each mirror is 320 /spl mu/m by 170 /spl mu/m and is individually addressable. In comparison to thin film micro-mirror arrays, the SCS mirror surface is optically flat and smooth, free of residual stress, and highly reflective after the deposition of a thin aluminum layer. In addition to a flat mirror, high-aspect-ratio grating structures have been fabricated on the surface of the mirrors, enhancing the optical manipulation potential of devices.
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机译：已设计，制造和测试了10 / spl次/ 10和5 / spl次/ 5，高镜面填充因子（<70％），低电压操作（> 30 V），单晶硅（SCS）微镜阵列。每个镜像的大小为320 / spl mu / m乘以170 / spl mu / m，并且可以单独寻址。与薄膜微镜阵列相比，SCS镜表面在光学上是平坦且平滑的，没有残留应力，并且在沉积薄铝层之后具有高反射性。除了平面镜之外，在镜的表面上还制造了高纵横比的光栅结构，从而增强了器件的光学操纵潜力。
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