首页> 外文会议>ISTM/2007;International symposium on test and measurement >An Optimal Design of Collimating Gap Height for Two Dimensional Industrial Computed Tomography Scanning
【24h】

An Optimal Design of Collimating Gap Height for Two Dimensional Industrial Computed Tomography Scanning

机译:二维工业计算机断层扫描的准直间隙高度的优化设计

获取原文

摘要

A designing method is proposed for the optimal design of collimating gap height in 2D-ICT(Two Dimensional Industrial Computed Tomography). This method is based on the variation of the projection contrast, through computer simulation, the curve of projection contrast versus collimating gap height at different type of modulation transfer function are obtained. At the beginning of the curve, the contrast increases linearly along with the increasing of the collimating gap height. And with the more increasing of the gap height, the projection contrast is close to saturation and the non-linear relation between them is obvious. And then to continue increasing the collimating gap height can't improve the projection contrast. The curve also displays that the higher the cut-off frequency of the imaging system is, the higher the slope of the linear segment of the curve will be, which means that the optimal collimating gap height is narrower at the same contrast value. On the base of the discovery, the author assumes that when the contrast arrives to 0.95 the corresponding collimating gap height is the optimal value, which can be regarded as the guidance of 2D-ICT system design.
机译:提出了二维工业计算机断层扫描中准直间隙高度的最佳设计方法。该方法基于投影对比度的变化,通过计算机仿真,得到了不同类型的调制传递函数下投影对比度与准直间隙高度的关系曲线。在曲线的开始,对比度随着准直间隙高度的增加而线性增加。并且随着间隙高度的增加,投影对比度接近饱和,并且它们之间的非线性关系是明显的。然后继续增加准直间隙高度不能改善投影对比度。该曲线还显示出,成像系统的截止频率越高,曲线的线性部分的斜率就越高,这意味着在相同的对比度值下,最佳的准直间隙高度越窄。在此发现的基础上,作者假设当对比度达到0.95时,相应的准直间隙高度为最佳值,可作为2D-ICT系统设计的指导。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号